On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00449337" target="_blank" >RIV/68378271:_____/15:00449337 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989592:15310/15:33154405 RIV/60461373:22310/15:43900733

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.apcatb.2014.10.015" target="_blank" >http://dx.doi.org/10.1016/j.apcatb.2014.10.015</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apcatb.2014.10.015" target="_blank" >10.1016/j.apcatb.2014.10.015</a>

Jazyk výsledku

angličtina

Název v původním jazyce

On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method

Popis výsledku v původním jazyce

Iron oxide (α-Fe2O3) hematite films were prepared by a novel high-power impulse magnetron sputtering method (HiPIMS). Some of the crucial issues of hematite are a large overpotential needed to develop the water oxidation photocurrent onset, high extent of surface defects acting as traps, and a short diffusion length (2–4 nm) of photogenerated holes. We report on minimizing these limits by deposition of highly photoactive nanocrystalline very thin ( 30 nm) absorbing hematite films by HiPIMS and their passivation by ultra-thin ( 2 nm) atomic layer deposited (ALD) isocrystalline alumina oxide (α-Al2O3) films. A new approach of one-step annealing of this bilayer system is introduced. The films were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, and electronic properties.

Název v anglickém jazyce

On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method

Popis výsledku anglicky

Iron oxide (α-Fe2O3) hematite films were prepared by a novel high-power impulse magnetron sputtering method (HiPIMS). Some of the crucial issues of hematite are a large overpotential needed to develop the water oxidation photocurrent onset, high extent of surface defects acting as traps, and a short diffusion length (2–4 nm) of photogenerated holes. We report on minimizing these limits by deposition of highly photoactive nanocrystalline very thin ( 30 nm) absorbing hematite films by HiPIMS and their passivation by ultra-thin ( 2 nm) atomic layer deposited (ALD) isocrystalline alumina oxide (α-Al2O3) films. A new approach of one-step annealing of this bilayer system is introduced. The films were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, and electronic properties.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Catalysis B - Environmental

ISSN

0926-3373

e-ISSN

—

Svazek periodika

165

Číslo periodika v rámci svazku

Apr

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

7

Strana od-do

344-350

Kód UT WoS článku

000347584200038

EID výsledku v databázi Scopus

2-s2.0-84908627727