Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F16%3A00471563" target="_blank" >RIV/68378271:_____/16:00471563 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1007/s00339-016-9971-4" target="_blank" >http://dx.doi.org/10.1007/s00339-016-9971-4</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/s00339-016-9971-4" target="_blank" >10.1007/s00339-016-9971-4</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration

Popis výsledku v původním jazyce

We report on excitation of the photoluminescence of lithium fluoride by means of the surface plasmon resonance of Al layer. Advantage of this method is high efficiency of the excitation, which is applicable to ultrathin films. P-polarized UV diode laser light is coupled to the surface plasmon resonance using a fused silica prism in Kretschmann configuration. The angular dependence of the reflected intensity is measured using a theta-2theta goniometer. The surface plasmon at resonance condition induces photoluminescence in the adjacent lithium fluoride layer. The fluoride layers were deposited on Al-coated fused silica substrates by electron beam evaporation. For the experiment, we prepared several samples with thickness ranging from 20 to 71 nm. We studied the effect of the luminescence enhancement by the surface plasmon resonance effect. Strong quenching effect was observed in the thinnest LiF layer. Influence of X-ray irradiation on the photoluminescence was studied.

Název v anglickém jazyce

Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration

Popis výsledku anglicky

We report on excitation of the photoluminescence of lithium fluoride by means of the surface plasmon resonance of Al layer. Advantage of this method is high efficiency of the excitation, which is applicable to ultrathin films. P-polarized UV diode laser light is coupled to the surface plasmon resonance using a fused silica prism in Kretschmann configuration. The angular dependence of the reflected intensity is measured using a theta-2theta goniometer. The surface plasmon at resonance condition induces photoluminescence in the adjacent lithium fluoride layer. The fluoride layers were deposited on Al-coated fused silica substrates by electron beam evaporation. For the experiment, we prepared several samples with thickness ranging from 20 to 71 nm. We studied the effect of the luminescence enhancement by the surface plasmon resonance effect. Strong quenching effect was observed in the thinnest LiF layer. Influence of X-ray irradiation on the photoluminescence was studied.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Physics A - Materials Science & Processing

ISSN

0947-8396

e-ISSN

—

Svazek periodika

122

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

7

Strana od-do

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Kód UT WoS článku

000372259900153

EID výsledku v databázi Scopus

2-s2.0-84961619714