Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F17%3A00486980" target="_blank" >RIV/68378271:_____/17:00486980 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1063/1.4977821" target="_blank" >http://dx.doi.org/10.1063/1.4977821</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4977821" target="_blank" >10.1063/1.4977821</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures

Popis výsledku v původním jazyce

A reactive high-power impulse magnetron sputtering (HiPIMS) process using a titanium target in a mixture of Ar/O2 has been investigated for different modes of operation including pure argon, metallic, transition, and compound mode. The trends and changes in the plasma density ne and the effective electron temperature Teff, have been measured by the time-resolved Langmuir probe technique. The same experimental process conditions have also been studied using a recently developed reactive ionization region model (R-IRM), making it possible to compare the acquired experimental results with the model results. It was found that trends in the plasma density and mean electron energy as measured by the Langmuir probe are in good agreement with the results obtained from the R-IRM model for different pulse discharge current densities.

Název v anglickém jazyce

Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures

Popis výsledku anglicky

A reactive high-power impulse magnetron sputtering (HiPIMS) process using a titanium target in a mixture of Ar/O2 has been investigated for different modes of operation including pure argon, metallic, transition, and compound mode. The trends and changes in the plasma density ne and the effective electron temperature Teff, have been measured by the time-resolved Langmuir probe technique. The same experimental process conditions have also been studied using a recently developed reactive ionization region model (R-IRM), making it possible to compare the acquired experimental results with the model results. It was found that trends in the plasma density and mean electron energy as measured by the Langmuir probe are in good agreement with the results obtained from the R-IRM model for different pulse discharge current densities.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/GA15-00863S" target="_blank" >GA15-00863S: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

—

Svazek periodika

121

Číslo periodika v rámci svazku

17

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

7

Strana od-do

—

Kód UT WoS článku

000400623700015

EID výsledku v databázi Scopus

2-s2.0-85014872134