Modified high frequency probe approach for diagnostics of highly reactive plasma

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12310%2F19%3A43899723" target="_blank" >RIV/60076658:12310/19:43899723 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989592:15310/19:73596363

Výsledek na webu

<a href="https://iopscience.iop.org/article/10.1088/1361-6595/ab506c" target="_blank" >https://iopscience.iop.org/article/10.1088/1361-6595/ab506c</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/ab506c" target="_blank" >10.1088/1361-6595/ab506c</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Modified high frequency probe approach for diagnostics of highly reactive plasma

Popis výsledku v původním jazyce

The paper introduces a modified approach of time resolved in situ diagnostics of highly reactive discharges (C2H2 in our case) usually used for a deposition process of various non-conductive thin films. Reactive plasma could create an insulating film onto inserted diagnostic tools, which distorts measured data and makes their processing unreliable; a typical problem of Langmuir probe measurements. The proposed approach utilizes a so-called radiofrequency (rf) Sobolewski probe for ion flux measurement which is further modified to also obtain the electron temperature in some cases and the ion density. In this work, we introduce the procedure where measured rf probe characteristics are transformed towards I?V curves of the plasma sheath with subtracted capacitive current. This processing enables not only the monitoring of plasma sheath impedance and the ion flux towards the substrate but also allows for an estimation of other parameters as the plasma density or electron temperature, respectively. We demonstrate that the substrate used for thin film deposition can act as an active probe itself. The relevance of the proposed method was verified in pure Ar discharge where the results correspond with conventional Langmuir probe diagnostics. Furthermore, internal plasma parameters of highly reactive Ar/C2H2 plasma, formed from acetylene, were evaluated, too.

Název v anglickém jazyce

Modified high frequency probe approach for diagnostics of highly reactive plasma

Popis výsledku anglicky

The paper introduces a modified approach of time resolved in situ diagnostics of highly reactive discharges (C2H2 in our case) usually used for a deposition process of various non-conductive thin films. Reactive plasma could create an insulating film onto inserted diagnostic tools, which distorts measured data and makes their processing unreliable; a typical problem of Langmuir probe measurements. The proposed approach utilizes a so-called radiofrequency (rf) Sobolewski probe for ion flux measurement which is further modified to also obtain the electron temperature in some cases and the ion density. In this work, we introduce the procedure where measured rf probe characteristics are transformed towards I?V curves of the plasma sheath with subtracted capacitive current. This processing enables not only the monitoring of plasma sheath impedance and the ion flux towards the substrate but also allows for an estimation of other parameters as the plasma density or electron temperature, respectively. We demonstrate that the substrate used for thin film deposition can act as an active probe itself. The relevance of the proposed method was verified in pure Ar discharge where the results correspond with conventional Langmuir probe diagnostics. Furthermore, internal plasma parameters of highly reactive Ar/C2H2 plasma, formed from acetylene, were evaluated, too.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

—

Svazek periodika

28

Číslo periodika v rámci svazku

11

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

—

Kód UT WoS článku

000499812800001

EID výsledku v databázi Scopus

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