Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F16%3A00470666" target="_blank" >RIV/68378271:_____/16:00470666 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1116/1.4953033" target="_blank" >http://dx.doi.org/10.1116/1.4953033</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.4953033" target="_blank" >10.1116/1.4953033</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

Popis výsledku v původním jazyce

A new planar ion flux probe, based on the Sobolewski method for time-resolved plasma characterization in inherently noisy pulsed plasma discharges, has been developed. The probe was evaluated in a high-power impulse magnetron sputtering (HiPIMS) process, which is a promising ionized physical vapor deposition technique based on pulsed plasma discharges used to engineer thin films with improved properties. Both nonreactive (pure Ar) and reactive (Ar/O-2) deposition processes were investigated using a Ti sputtering target. It was found that the process exhibited a nearly hysteresis-free and stable transition region at the chosen deposition conditions. Time-resolved measurements of the absolute ion flux impinging on the probe placed at the substrate position, as well as of the probe sheath impedance, were recorded in the metal, transition, and compound modes during the HiPIMS pulse. Gradual changes in the measured ion flux were seen when transiting from the metal mode to the compound mode.

Název v anglickém jazyce

Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

Popis výsledku anglicky

A new planar ion flux probe, based on the Sobolewski method for time-resolved plasma characterization in inherently noisy pulsed plasma discharges, has been developed. The probe was evaluated in a high-power impulse magnetron sputtering (HiPIMS) process, which is a promising ionized physical vapor deposition technique based on pulsed plasma discharges used to engineer thin films with improved properties. Both nonreactive (pure Ar) and reactive (Ar/O-2) deposition processes were investigated using a Ti sputtering target. It was found that the process exhibited a nearly hysteresis-free and stable transition region at the chosen deposition conditions. Time-resolved measurements of the absolute ion flux impinging on the probe placed at the substrate position, as well as of the probe sheath impedance, were recorded in the metal, transition, and compound modes during the HiPIMS pulse. Gradual changes in the measured ion flux were seen when transiting from the metal mode to the compound mode.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

<a href="/cs/project/GA15-00863S" target="_blank" >GA15-00863S: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films

ISSN

0734-2101

e-ISSN

—

Svazek periodika

34

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

10

Strana od-do

—

Kód UT WoS článku

000379588000011

EID výsledku v databázi Scopus

2-s2.0-84974602716