Electron affinity of B-doped nanocrystalline diamonds
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F17%3A00486997" target="_blank" >RIV/68378271:_____/17:00486997 - isvavai.cz</a>
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Electron affinity of B-doped nanocrystalline diamonds
Popis výsledku v původním jazyce
Electron affinity in semiconductors is defined as an energy distance from the conduction band minimum (CBM) to the vacuum level. Usually, the vacuum level is above the CBM known as the positive electron affinity (PEA). In case of negative electron affinity (NEA), the CBM is above the vacuum level. Diamond electron affinity (DEA) can be tuned by its surface termination. Here, the dependence of DEA on a) boron doping and b) surface termination is studied by ultraviolet photoelectron spectroscopy (UPS). Boron doped nanocrystalline diamond films (B-NCD) were grown by double bias enhanced hot filament chemical vapor deposition on Si substrate using the gas mixture of trimethylborane and CH4 in H2. The H-termination was done by hydrogen microwave plasma treatment. It was found that, the electron affinity of B-NCD/H surfaces varies with the boron concentration.
Název v anglickém jazyce
Electron affinity of B-doped nanocrystalline diamonds
Popis výsledku anglicky
Electron affinity in semiconductors is defined as an energy distance from the conduction band minimum (CBM) to the vacuum level. Usually, the vacuum level is above the CBM known as the positive electron affinity (PEA). In case of negative electron affinity (NEA), the CBM is above the vacuum level. Diamond electron affinity (DEA) can be tuned by its surface termination. Here, the dependence of DEA on a) boron doping and b) surface termination is studied by ultraviolet photoelectron spectroscopy (UPS). Boron doped nanocrystalline diamond films (B-NCD) were grown by double bias enhanced hot filament chemical vapor deposition on Si substrate using the gas mixture of trimethylborane and CH4 in H2. The H-termination was done by hydrogen microwave plasma treatment. It was found that, the electron affinity of B-NCD/H surfaces varies with the boron concentration.
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
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OECD FORD obor
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Návaznosti výsledku
Projekt
<a href="/cs/project/GBP108%2F12%2FG108" target="_blank" >GBP108/12/G108: Příprava, modifikace a charakterizace materiálů zářením</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2017
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů