The changes induced on oriented ZnO surface by inductively coupled plasma (ICP)

Kód výsledku v IS VaVaI

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Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

The changes induced on oriented ZnO surface by inductively coupled plasma (ICP)

Popis výsledku v původním jazyce

The plasma treatment has been done in a novel inductively coupled plasma (ICP) quartz reactor recently developed in the cooperation with the Czech company SVCS Process Innovation s. r. o. in Valazske Mezirici. The reactor operates at the radio frequency 13.56 MHz with up to 300 W discharge power and H2, O2, N2 and Ar process gasses at low pressure about 20 Pa. X-ray photoelectron spectroscopy (XPS) showed contamination of plasma processed ZnO powder surface by silicon and fluorine from quartz walls and polytetrafluoroethylene (PFTE) sealing that disappeared after reducing a parasitic capacitive coupling between antenna and grounded stainless steel holder. We measure topography and surface potential of ZnO nanorods and monocrystalline ZnO samples after different plasma treatments by atomic force microscopy (AFM) and Kelvin probe force microscopy (KFPM). Preliminary results show similar morphology before and after plasma treatment, but different average surface potential values.

Název v anglickém jazyce

The changes induced on oriented ZnO surface by inductively coupled plasma (ICP)

Popis výsledku anglicky

The plasma treatment has been done in a novel inductively coupled plasma (ICP) quartz reactor recently developed in the cooperation with the Czech company SVCS Process Innovation s. r. o. in Valazske Mezirici. The reactor operates at the radio frequency 13.56 MHz with up to 300 W discharge power and H2, O2, N2 and Ar process gasses at low pressure about 20 Pa. X-ray photoelectron spectroscopy (XPS) showed contamination of plasma processed ZnO powder surface by silicon and fluorine from quartz walls and polytetrafluoroethylene (PFTE) sealing that disappeared after reducing a parasitic capacitive coupling between antenna and grounded stainless steel holder. We measure topography and surface potential of ZnO nanorods and monocrystalline ZnO samples after different plasma treatments by atomic force microscopy (AFM) and Kelvin probe force microscopy (KFPM). Preliminary results show similar morphology before and after plasma treatment, but different average surface potential values.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů