Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00552189" target="_blank" >RIV/68378271:_____/21:00552189 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989592:15310/21:73610034

Výsledek na webu

<a href="https://doi.org/10.1063/5.0046829" target="_blank" >https://doi.org/10.1063/5.0046829</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/5.0046829" target="_blank" >10.1063/5.0046829</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma

Popis výsledku v původním jazyce

A plasma-assisted atomic layer deposition system employing a microwave surfatron plasma was developed and characterized by spatially resolved Langmuir probe diagnostics and optical emission spectroscopy. The deposition process was applied on TiO2 thin films prepared on Si wafers. The surfatron is equipped with a small ring electrode serving as a source of weak radio frequency plasma helping with fast and reliable ignition of the discharge in molecular gas. Results evaluated in the pure argon plasma proved that the plasma potential and the plasma density are homogeneous in the radial direction, while a rapid decrease was observed in the axial direction. Adding up to 30% of nitrogen into the gas mixture led to less homogeneous plasma parameters in the radial direction together with the increase of the electron effective temperature. Optical emission spectra revealed many Ar I lines of neutral atoms with only a few Ar II ions’ lines.

Název v anglickém jazyce

Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma

Popis výsledku anglicky

A plasma-assisted atomic layer deposition system employing a microwave surfatron plasma was developed and characterized by spatially resolved Langmuir probe diagnostics and optical emission spectroscopy. The deposition process was applied on TiO2 thin films prepared on Si wafers. The surfatron is equipped with a small ring electrode serving as a source of weak radio frequency plasma helping with fast and reliable ignition of the discharge in molecular gas. Results evaluated in the pure argon plasma proved that the plasma potential and the plasma density are homogeneous in the radial direction, while a rapid decrease was observed in the axial direction. Adding up to 30% of nitrogen into the gas mixture led to less homogeneous plasma parameters in the radial direction together with the increase of the electron effective temperature. Optical emission spectra revealed many Ar I lines of neutral atoms with only a few Ar II ions’ lines.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

1089-7550

Svazek periodika

130

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

18

Strana od-do

013301

Kód UT WoS článku

000668677200001

EID výsledku v databázi Scopus

2-s2.0-85109035104