Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00573847" target="_blank" >RIV/68378271:_____/23:00573847 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11320/23:10468535 RIV/61989592:15310/23:73620139

Výsledek na webu

<a href="https://doi.org/10.1016/j.vacuum.2023.112272" target="_blank" >https://doi.org/10.1016/j.vacuum.2023.112272</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2023.112272" target="_blank" >10.1016/j.vacuum.2023.112272</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films

Popis výsledku v původním jazyce

A hollow cathode discharge with a CuNi (Cu50Ni50) cathode is operated inside a vacuum chamber with Ar gas flowing through its nozzle. O2 gas is admitted to the vaccum chamber. Typical Ar+O2 gas pressures are in the range of 2–50 Pa. The energy distribution of plasma ions is investigated with the help of energy-resolved mass spectrometry. Singly charged Ar+ and molecular O+2 ions are the most abundant ionic species. Deposition rate and heat flux to a substrate increase as function of discharge current. At high pressures, the deposition rate is further increased by the directional gas flow, which becomes more focused onto the substrate. Deposited and annealed thin films are analysed by X-ray diffraction and Raman spectroscopy.

Název v anglickém jazyce

Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films

Popis výsledku anglicky

A hollow cathode discharge with a CuNi (Cu50Ni50) cathode is operated inside a vacuum chamber with Ar gas flowing through its nozzle. O2 gas is admitted to the vaccum chamber. Typical Ar+O2 gas pressures are in the range of 2–50 Pa. The energy distribution of plasma ions is investigated with the help of energy-resolved mass spectrometry. Singly charged Ar+ and molecular O+2 ions are the most abundant ionic species. Deposition rate and heat flux to a substrate increase as function of discharge current. At high pressures, the deposition rate is further increased by the directional gas flow, which becomes more focused onto the substrate. Deposited and annealed thin films are analysed by X-ray diffraction and Raman spectroscopy.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

1879-2715

Svazek periodika

215

Číslo periodika v rámci svazku

Sept.

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

11

Strana od-do

112272

Kód UT WoS článku

001025992800001

EID výsledku v databázi Scopus

2-s2.0-85162097249