Mass spectrometry investigation of magnetron sputtering discharges

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43932215" target="_blank" >RIV/49777513:23520/17:43932215 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/17:00477676

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.vacuum.2017.06.032" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2017.06.032</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2017.06.032" target="_blank" >10.1016/j.vacuum.2017.06.032</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Mass spectrometry investigation of magnetron sputtering discharges

Popis výsledku v původním jazyce

This paper deals with the mass spectrometric characterization of atoms, radicals and ions generated in the RF magnetron discharges sputtering metal targets in Ne, Ar, Kr and Xe gases. In magnetron discharges different kinds of species such as atoms, radicals and positive and negative ions according to the target material and sputtering gas pressure can be generated. The mass spectrometry of the magnetron discharge, which gives the detailed information on these species, is of key importance for the development of new advanced thin films. The amount of individual atoms, radicals and ions and the ion energy distribution as a function of flow and pressure of the sputtering gas, and the magnetron power is discussed in detail. This article shows (1) the ion distribution functions of gas and sputtered target material ions as a function of sputtering gas pressure, (2) the evolution of the amount of single-ionized and double-ionized atoms of gases and metals generated in the RF discharge during sputtering of Ag films in various inert gases as a function of gas pressure, and (3) the contamination of the sputtered metallic films by the oxygen from a residual gas atmosphere in the deposition chamber at low film deposition rates.

Název v anglickém jazyce

Mass spectrometry investigation of magnetron sputtering discharges

Popis výsledku anglicky

This paper deals with the mass spectrometric characterization of atoms, radicals and ions generated in the RF magnetron discharges sputtering metal targets in Ne, Ar, Kr and Xe gases. In magnetron discharges different kinds of species such as atoms, radicals and positive and negative ions according to the target material and sputtering gas pressure can be generated. The mass spectrometry of the magnetron discharge, which gives the detailed information on these species, is of key importance for the development of new advanced thin films. The amount of individual atoms, radicals and ions and the ion energy distribution as a function of flow and pressure of the sputtering gas, and the magnetron power is discussed in detail. This article shows (1) the ion distribution functions of gas and sputtered target material ions as a function of sputtering gas pressure, (2) the evolution of the amount of single-ionized and double-ionized atoms of gases and metals generated in the RF discharge during sputtering of Ag films in various inert gases as a function of gas pressure, and (3) the contamination of the sputtered metallic films by the oxygen from a residual gas atmosphere in the deposition chamber at low film deposition rates.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

—

Svazek periodika

143

Číslo periodika v rámci svazku

SEP 2017

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

6

Strana od-do

438-443

Kód UT WoS článku

000407654900062

EID výsledku v databázi Scopus

2-s2.0-85021811235