Dual-wavelength femtosecond laser-induced single-shot damage and ablation of silicon

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F24%3A00584941" target="_blank" >RIV/68378271:_____/24:00584941 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21340/24:00375523 RIV/00216208:11320/24:10471271

Výsledek na webu

<a href="https://doi.org/10.1016/j.apsusc.2023.158626" target="_blank" >https://doi.org/10.1016/j.apsusc.2023.158626</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2023.158626" target="_blank" >10.1016/j.apsusc.2023.158626</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Dual-wavelength femtosecond laser-induced single-shot damage and ablation of silicon

Popis výsledku v původním jazyce

An experimental and theoretical study of laser-induced damage and ablation of silicon by two individual femtosecond pulses of different wavelengths, 1030 and 515 nm, is performed to address the physical mechanisms of dual-wavelength ablation and reveal possibilities for increasing the ablation efficiency. The produced craters and damaged areas are analyzed as a function of laser fluence and time separation between the pulses and are compared with monochromatic irradiation. The order of pulses is demonstrated to be essential in bi-color ablation with higher material removal rates when a shorter-wavelength pulse arrives first at the surface. Simulations based on the two-temperature model show that the visible pulse is profitable for the generation of the electron-hole plasma while the delayed IR pulse is efficiently absorbed in the plasma enhancing energy coupling to the target. At long delays of 30–100 ps, the dual-wavelength ablation is found to be particularly strong with formation of deep smooth craters. This is explained by the expansion of a hot liquid layer produced by the first pulse with a drastic decrease in the surface reflectivity at this timescale. The results provide insight into the processes of dual-wavelength laser ablation offering a better control of the energy deposition into material.

Název v anglickém jazyce

Dual-wavelength femtosecond laser-induced single-shot damage and ablation of silicon

Popis výsledku anglicky

An experimental and theoretical study of laser-induced damage and ablation of silicon by two individual femtosecond pulses of different wavelengths, 1030 and 515 nm, is performed to address the physical mechanisms of dual-wavelength ablation and reveal possibilities for increasing the ablation efficiency. The produced craters and damaged areas are analyzed as a function of laser fluence and time separation between the pulses and are compared with monochromatic irradiation. The order of pulses is demonstrated to be essential in bi-color ablation with higher material removal rates when a shorter-wavelength pulse arrives first at the surface. Simulations based on the two-temperature model show that the visible pulse is profitable for the generation of the electron-hole plasma while the delayed IR pulse is efficiently absorbed in the plasma enhancing energy coupling to the target. At long delays of 30–100 ps, the dual-wavelength ablation is found to be particularly strong with formation of deep smooth craters. This is explained by the expansion of a hot liquid layer produced by the first pulse with a drastic decrease in the surface reflectivity at this timescale. The results provide insight into the processes of dual-wavelength laser ablation offering a better control of the energy deposition into material.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

<a href="/cs/project/EF15_003%2F0000445" target="_blank" >EF15_003/0000445: Pokročilá příprava funkčních materiálů: Od mono k bi- a tri-chromatické excitaci s použitím tvarovaných laserových pulsů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

1873-5584

Svazek periodika

643

Číslo periodika v rámci svazku

Jan

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

15

Strana od-do

158626

Kód UT WoS článku

001094464900001

EID výsledku v databázi Scopus

2-s2.0-85174217168