Surface changes induced by plasma treatment and high temperature annealing of silicon dioxide microparticles

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F24%3A00587391" target="_blank" >RIV/68378271:_____/24:00587391 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21110/24:00375057

Výsledek na webu

<a href="https://www.confer.cz/nanocon/2023/read/4781-silicon-dioxide-microparticles-modification-by-temperature-and-plasma-treatment.pdf" target="_blank" >https://www.confer.cz/nanocon/2023/read/4781-silicon-dioxide-microparticles-modification-by-temperature-and-plasma-treatment.pdf</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.37904/nanocon.2023.4781" target="_blank" >10.37904/nanocon.2023.4781</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Surface changes induced by plasma treatment and high temperature annealing of silicon dioxide microparticles

Popis výsledku v původním jazyce

Due to the high surface to volume ratio, the particles’ surface properties modification defines its properties in general, which is crucial for their use. From this point of view, plasma processing or high temperature annealing can be considered as the universal techniques for efficient modification of materials in the form of powder. In this study, the silicon dioxide microparticles have been treated in a hydrogen, oxygen or vacuum by low temperature plasma or annealing. The change of SiO2 microparticles properties was investigated by photoluminescence spectroscopy at room and low temperature. High temperature annealing in hydrogen induced under UV excitation photoluminescence in the near UV and visible light indicating the change of defect states on the surface of the microparticles. We believe that observed findings clearly demonstrate useful method for analysis of SiO2 microparticles surface modification attractive also for fundamental research.

Název v anglickém jazyce

Surface changes induced by plasma treatment and high temperature annealing of silicon dioxide microparticles

Popis výsledku anglicky

Due to the high surface to volume ratio, the particles’ surface properties modification defines its properties in general, which is crucial for their use. From this point of view, plasma processing or high temperature annealing can be considered as the universal techniques for efficient modification of materials in the form of powder. In this study, the silicon dioxide microparticles have been treated in a hydrogen, oxygen or vacuum by low temperature plasma or annealing. The change of SiO2 microparticles properties was investigated by photoluminescence spectroscopy at room and low temperature. High temperature annealing in hydrogen induced under UV excitation photoluminescence in the near UV and visible light indicating the change of defect states on the surface of the microparticles. We believe that observed findings clearly demonstrate useful method for analysis of SiO2 microparticles surface modification attractive also for fundamental research.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

NANOCON 2023 Conference Proceedings

ISBN

978-80-88365-15-0

ISSN

2694-930X

e-ISSN

—

Počet stran výsledku

7

Strana od-do

196-202

Název nakladatele

Tanger Ltd.

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

18. 10. 2023

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

001234125400032