Effect of magnetron configuration on the spatial distribution of sputtered species in high-power impulse magnetron sputtering (HiPIMS) plasmas

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00619213" target="_blank" >RIV/68378271:_____/25:00619213 - isvavai.cz</a>

Výsledek na webu

<a href="https://hdl.handle.net/11104/0365951" target="_blank" >https://hdl.handle.net/11104/0365951</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2025.114324" target="_blank" >10.1016/j.vacuum.2025.114324</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of magnetron configuration on the spatial distribution of sputtered species in high-power impulse magnetron sputtering (HiPIMS) plasmas

Popis výsledku v původním jazyce

This study examines the two-dimensional (2D) spatial distribution of the ionized flux fraction (IFF) and total flux of sputtered species in a non-reactive high-power impulse magnetron sputtering discharge for a peak current density of ≈1.3 A/cm2. Five magnetic configurations of the magnetron cathode, ranging from highly unbalanced to highly balanced, were systematically investigated. Flux measurements were performed using a quartz crystal microbalance with an electron magnetic filter. IFF was axially and radially scanned in the diffusion plasma in a plane normal to the target. These measurements resulted in comprehensive 2D maps of the metal ions' flux distribution within the region of particular interest, where the substrates are typically placed. The experimental findings are further compared and correlated with the modeled magnetic field distribution. Our study provides deeper insight into the impact of the magnets’ arrangement on the thin film deposition process, offering potential benefits for a wide range of applications where tailored thin film properties are essential.

Název v anglickém jazyce

Effect of magnetron configuration on the spatial distribution of sputtered species in high-power impulse magnetron sputtering (HiPIMS) plasmas

Popis výsledku anglicky

This study examines the two-dimensional (2D) spatial distribution of the ionized flux fraction (IFF) and total flux of sputtered species in a non-reactive high-power impulse magnetron sputtering discharge for a peak current density of ≈1.3 A/cm2. Five magnetic configurations of the magnetron cathode, ranging from highly unbalanced to highly balanced, were systematically investigated. Flux measurements were performed using a quartz crystal microbalance with an electron magnetic filter. IFF was axially and radially scanned in the diffusion plasma in a plane normal to the target. These measurements resulted in comprehensive 2D maps of the metal ions' flux distribution within the region of particular interest, where the substrates are typically placed. The experimental findings are further compared and correlated with the modeled magnetic field distribution. Our study provides deeper insight into the impact of the magnets’ arrangement on the thin film deposition process, offering potential benefits for a wide range of applications where tailored thin film properties are essential.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/EH22_008%2F0004596" target="_blank" >EH22_008/0004596: Senzory a detektory pro informační společnost budoucnosti</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

1879-2715

Svazek periodika

238

Číslo periodika v rámci svazku

Aug

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

8

Strana od-do

114324

Kód UT WoS článku

001477626700001

EID výsledku v databázi Scopus

2-s2.0-105002802582