Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00567078" target="_blank" >RIV/68378271:_____/23:00567078 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11320/23:10468538

Výsledek na webu

<a href="https://doi.org/10.1116/6.0002309" target="_blank" >https://doi.org/10.1116/6.0002309</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/6.0002309" target="_blank" >10.1116/6.0002309</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Popis výsledku v původním jazyce

The study is focused on the impact of different magnetic field configurations of a high-power impulse magnetron sputtering (HiPIMS) in a nonreactive mode on the film precursors. Ionized flux fraction and total flux deposited onto the substrate were measured with the magnetic quartz crystal microbalance probe placed in front of the target racetrack. Particularly, we investigated the degree of magnetron balancing and the geometry of the magnetic field above the Ti target surface (4 in. diameter), as crucial factors influencing the thin film deposition, for different HiPIMS pulse lengths. Three unbalanced (II type) magnetron configurations have been chosen for this study: two symmetric geometries—with a regular magnetic field (B parallel to the target about 80 and 35 mT) and one asymmetric (highly unbalanced) magnetron configuration with an intermediate magnetic field (B parallel to the target about 48 mT).

Název v anglickém jazyce

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Popis výsledku anglicky

The study is focused on the impact of different magnetic field configurations of a high-power impulse magnetron sputtering (HiPIMS) in a nonreactive mode on the film precursors. Ionized flux fraction and total flux deposited onto the substrate were measured with the magnetic quartz crystal microbalance probe placed in front of the target racetrack. Particularly, we investigated the degree of magnetron balancing and the geometry of the magnetic field above the Ti target surface (4 in. diameter), as crucial factors influencing the thin film deposition, for different HiPIMS pulse lengths. Three unbalanced (II type) magnetron configurations have been chosen for this study: two symmetric geometries—with a regular magnetic field (B parallel to the target about 80 and 35 mT) and one asymmetric (highly unbalanced) magnetron configuration with an intermediate magnetic field (B parallel to the target about 48 mT).

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films

ISSN

0734-2101

e-ISSN

1520-8559

Svazek periodika

41

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

8

Strana od-do

013003

Kód UT WoS článku

000900746200002

EID výsledku v databázi Scopus

2-s2.0-85144630949