Understanding the growth of refractory high-entropy alloys by magnetron sputtering via in situ plasma diagnostics

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00638958" target="_blank" >RIV/68378271:_____/25:00638958 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11320/25:10508254

Výsledek na webu

<a href="https://hdl.handle.net/11104/0370242" target="_blank" >https://hdl.handle.net/11104/0370242</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2025.132610" target="_blank" >10.1016/j.surfcoat.2025.132610</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Understanding the growth of refractory high-entropy alloys by magnetron sputtering via in situ plasma diagnostics

Popis výsledku v původním jazyce

The growth of equimolar and non-equimolar HfNbTiVZr thin films deposited by DC magnetron sputtering deposition is investigated by in situ real time plasma monitoring with various surface analysis techniques. Plasma monitoring via optical emission spectroscopy revealed that low-energy deposition conditions led to an amor-phous film under low-temperature deposition conditions. The equimolar system is sensitive to Ti losses during deposition, whereas the off-stochiometric case has significant V and Zr losses in the plasma phase at high Ar pressures. Crystallinity was induced in the HfNbTiVZr equimolar films by postdeposition annealing at 750 ◦C, whereas Hf0.75Nb0.75TiV1.25Zr1.25 maintained its amorphous state due to the larger δ parameter.

Název v anglickém jazyce

Understanding the growth of refractory high-entropy alloys by magnetron sputtering via in situ plasma diagnostics

Popis výsledku anglicky

The growth of equimolar and non-equimolar HfNbTiVZr thin films deposited by DC magnetron sputtering deposition is investigated by in situ real time plasma monitoring with various surface analysis techniques. Plasma monitoring via optical emission spectroscopy revealed that low-energy deposition conditions led to an amor-phous film under low-temperature deposition conditions. The equimolar system is sensitive to Ti losses during deposition, whereas the off-stochiometric case has significant V and Zr losses in the plasma phase at high Ar pressures. Crystallinity was induced in the HfNbTiVZr equimolar films by postdeposition annealing at 750 ◦C, whereas Hf0.75Nb0.75TiV1.25Zr1.25 maintained its amorphous state due to the larger δ parameter.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

1879-3347

Svazek periodika

515

Číslo periodika v rámci svazku

Nov

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

9

Strana od-do

132610

Kód UT WoS článku

001562629600001

EID výsledku v databázi Scopus

2-s2.0-105014252435