Investigations on the CuI thin films production by pulsed laser deposition

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00562426" target="_blank" >RIV/68378271:_____/22:00562426 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.apsusc.2022.154868" target="_blank" >https://doi.org/10.1016/j.apsusc.2022.154868</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2022.154868" target="_blank" >10.1016/j.apsusc.2022.154868</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Investigations on the CuI thin films production by pulsed laser deposition

Popis výsledku v původním jazyce

CuI thin films were deposited by pulsed laser deposition (PLD) in various Ar atmospheres. Control over the morphology, structure and defect nature of the deposited films was attempted by in-situ plasma diagnostics. The deposited films presented stoichiometric crystallinity on the full range of experimental condition with no residual oxidation, as per XRD and XPS measurements. Band gap tailoring was achieved by controlling the plasma ion kinetic energy with optimum conditions being defined by Cu and I ionic groups with kinetic energies surpassing 200 eV. Variation in Ar pressure allowed control over the nature of vacancies from VI + Cui to predominantly VCu. In situ plasma measurements revealed that the addition of Ar leads to the preferentially scattering of the Cu ions in the plasma which subsequently leads Cu ions energy losses.

Název v anglickém jazyce

Investigations on the CuI thin films production by pulsed laser deposition

Popis výsledku anglicky

CuI thin films were deposited by pulsed laser deposition (PLD) in various Ar atmospheres. Control over the morphology, structure and defect nature of the deposited films was attempted by in-situ plasma diagnostics. The deposited films presented stoichiometric crystallinity on the full range of experimental condition with no residual oxidation, as per XRD and XPS measurements. Band gap tailoring was achieved by controlling the plasma ion kinetic energy with optimum conditions being defined by Cu and I ionic groups with kinetic energies surpassing 200 eV. Variation in Ar pressure allowed control over the nature of vacancies from VI + Cui to predominantly VCu. In situ plasma measurements revealed that the addition of Ar leads to the preferentially scattering of the Cu ions in the plasma which subsequently leads Cu ions energy losses.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

1873-5584

Svazek periodika

606

Číslo periodika v rámci svazku

Dec

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

9

Strana od-do

154868

Kód UT WoS článku

000860232400005

EID výsledku v databázi Scopus

2-s2.0-85138777636