Improving HER and OER reactions by tailoring oxidation reactions during pulsed laser deposition of TiON thin films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F25%3A00641772" target="_blank" >RIV/68378271:_____/25:00641772 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/60461373:22310/25:43933284

Výsledek na webu

<a href="https://hdl.handle.net/11104/0371815" target="_blank" >https://hdl.handle.net/11104/0371815</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsadv.2025.100877" target="_blank" >10.1016/j.apsadv.2025.100877</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Improving HER and OER reactions by tailoring oxidation reactions during pulsed laser deposition of TiON thin films

Popis výsledku v původním jazyce

Control over the gas-phase oxidation reaction during pulsed laser deposition (PLD) of 150 nm TiN films under varying O₂ atmospheres was achieved by tailoring surface oxidation states which showed a good potential for rare-metal-free water splitting. An optimum for the nitrogen occupation was found at 0.1 Pa O2, which corre-sponds to the highest deposition energies during film growth. Additionally, the increase in deposition temperature up to allows a better incorporation of nitrogen up to a value of 2.5. The deposition process was monitored via angle- and time-resolved Langmuir probe measurements combined with optical emission spectroscopy. Under residual atmosphere conditions, high kinetic ion energy which reached 1.8 keV facilitated both gas‒phase oxidation and thermal oxidation of the films. In the intermediate pressure regime, where energies where in the range of hundreds of eV, the formation of suboxides and fractional nitrides was observed, with the transition towards TiO₂ driven by increased plasma ion acceleration and increased ion density by a factor of 1.2. The integration of advanced plasma diagnostics with thin-film analysis provides a deeper understanding of the oxidation dynamics in PLD, offering valuable insights for tailoring the properties of oxynitride thin films.

Název v anglickém jazyce

Improving HER and OER reactions by tailoring oxidation reactions during pulsed laser deposition of TiON thin films

Popis výsledku anglicky

Control over the gas-phase oxidation reaction during pulsed laser deposition (PLD) of 150 nm TiN films under varying O₂ atmospheres was achieved by tailoring surface oxidation states which showed a good potential for rare-metal-free water splitting. An optimum for the nitrogen occupation was found at 0.1 Pa O2, which corre-sponds to the highest deposition energies during film growth. Additionally, the increase in deposition temperature up to allows a better incorporation of nitrogen up to a value of 2.5. The deposition process was monitored via angle- and time-resolved Langmuir probe measurements combined with optical emission spectroscopy. Under residual atmosphere conditions, high kinetic ion energy which reached 1.8 keV facilitated both gas‒phase oxidation and thermal oxidation of the films. In the intermediate pressure regime, where energies where in the range of hundreds of eV, the formation of suboxides and fractional nitrides was observed, with the transition towards TiO₂ driven by increased plasma ion acceleration and increased ion density by a factor of 1.2. The integration of advanced plasma diagnostics with thin-film analysis provides a deeper understanding of the oxidation dynamics in PLD, offering valuable insights for tailoring the properties of oxynitride thin films.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

<a href="/cs/project/EH22_010%2F0008124" target="_blank" >EH22_010/0008124: MSCA Fellowships CZ FZU II</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science Advances

ISSN

2666-5239

e-ISSN

2666-5239

Svazek periodika

30

Číslo periodika v rámci svazku

Dec

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

10

Strana od-do

100877

Kód UT WoS článku

001614829100001

EID výsledku v databázi Scopus

2-s2.0-105020969700