Application of micro and macro scratch tests measurement for testing of DLC and TiO2 thin films
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F12%3A00198212" target="_blank" >RIV/68407700:21220/12:00198212 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/68407700:21460/12:00198212
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Application of micro and macro scratch tests measurement for testing of DLC and TiO2 thin films
Popis výsledku v původním jazyce
In this work, we focused on the usability of scratch test technique for determination of thin films adhesion with the layer thicknesses around 100 nanometres. Thin films of diamond-like carbon (DLC)(values of sp3 bonds from 40% to 70 %) and titanium dioxide (TiO2) (anatase, rutile) were prepared by Pulsed Laser Deposition (PLD). The basic substrates were silicon wafers Si(111) and titanium alloy. Thicknesses of prepared layers were in range of 60 nm to 100 nm for DLC and 100 nm to 140 nm for TiO2. Mechanical properties were tested using micro and macro methods. Microhardness was evaluated by AFM nanoindentation head Solver Next and Hysitron nanoindenter were used. Adhesion was measured using AFM head, Hysitron nanoindenter and CSM Revetester. For all samples (DLC, TiO2) the Young's moduli were determined also. We observed and compared abilities for the each individual instrument to evaluate adhesion of thin films with thickness of several tenths of nanometres. For the evaluation we use
Název v anglickém jazyce
Application of micro and macro scratch tests measurement for testing of DLC and TiO2 thin films
Popis výsledku anglicky
In this work, we focused on the usability of scratch test technique for determination of thin films adhesion with the layer thicknesses around 100 nanometres. Thin films of diamond-like carbon (DLC)(values of sp3 bonds from 40% to 70 %) and titanium dioxide (TiO2) (anatase, rutile) were prepared by Pulsed Laser Deposition (PLD). The basic substrates were silicon wafers Si(111) and titanium alloy. Thicknesses of prepared layers were in range of 60 nm to 100 nm for DLC and 100 nm to 140 nm for TiO2. Mechanical properties were tested using micro and macro methods. Microhardness was evaluated by AFM nanoindentation head Solver Next and Hysitron nanoindenter were used. Adhesion was measured using AFM head, Hysitron nanoindenter and CSM Revetester. For all samples (DLC, TiO2) the Young's moduli were determined also. We observed and compared abilities for the each individual instrument to evaluate adhesion of thin films with thickness of several tenths of nanometres. For the evaluation we use
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
BH - Optika, masery a lasery
OECD FORD obor
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Návaznosti výsledku
Projekt
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Návaznosti
S - Specificky vyzkum na vysokych skolach
Ostatní
Rok uplatnění
2012
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů