a-SiC Thin Film Prepared by PECVD Technique

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F12%3A00199833" target="_blank" >RIV/68407700:21220/12:00199833 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

a-SiC Thin Film Prepared by PECVD Technique

Popis výsledku v původním jazyce

In this contribution the effects of the substrate on the mechanical properties of amorphous silicon carbon (a-SiC) thin films were investigated. Coatings of thickness approximately 2 ?m were prepared by plasma enhanced chemical vapor deposition (PECVD) technique on three various metal substrates (AISI M2, AISI L2 and TiAl6V4). The a-SiC layers were prepared by vapor decomposition of liquid Hexamethyldisiloxane (HMDSO) diluted and mixed by mixture of argon and methane. We studied deposition rate as function flow of HMDSO, adhesive properties of coatings, coefficient of friction and running of hardness by cyclic nanoindentation test. The results showed that vapors of HMDSO causes the highest deposition rate of film (35 nm/min) at flow 1 g/h. Further, thesubstrate AISI M2 (hardened tool steel) caused better mechanical properties of a-SiC coating than others studied substrates.

Název v anglickém jazyce

a-SiC Thin Film Prepared by PECVD Technique

Popis výsledku anglicky

In this contribution the effects of the substrate on the mechanical properties of amorphous silicon carbon (a-SiC) thin films were investigated. Coatings of thickness approximately 2 ?m were prepared by plasma enhanced chemical vapor deposition (PECVD) technique on three various metal substrates (AISI M2, AISI L2 and TiAl6V4). The a-SiC layers were prepared by vapor decomposition of liquid Hexamethyldisiloxane (HMDSO) diluted and mixed by mixture of argon and methane. We studied deposition rate as function flow of HMDSO, adhesive properties of coatings, coefficient of friction and running of hardness by cyclic nanoindentation test. The results showed that vapors of HMDSO causes the highest deposition rate of film (35 nm/min) at flow 1 g/h. Further, thesubstrate AISI M2 (hardened tool steel) caused better mechanical properties of a-SiC coating than others studied substrates.

Druh

O - Ostatní výsledky

CEP obor

JK - Koroze a povrchové úpravy materiálu

OECD FORD obor

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Projekt

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Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů