Optical PMMA Waveguides Fabricated by Modification of Refractive Index Applying Electric Field

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F10%3A00169672" target="_blank" >RIV/68407700:21230/10:00169672 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/60461373:22310/10:00023141

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Optical PMMA Waveguides Fabricated by Modification of Refractive Index Applying Electric Field

Popis výsledku v původním jazyce

In this paper, we describe results of our recent experiments on electric field assisted patterning of thin polymethylmethacrylate (PMMA) layers. Micro-sized patterns were created on thin PMMA films by the effect of external electric field, perpendicularto the film surface. The PMMA film, prepared by spin-coating onto Si or Si/SiO2 wafer, was heated to the fluid temperature (275°C) and a linear pattern was created by the effect of electric field produced by a strip electrode. The dependence of the formand size of the created patterns on the intensity of the electric field, exposure time and initial film thickness was examined. Wave guiding properties were analyzed by mode spectroscopy, optical losses were measured by dispersive method and the createdpatterns were analyzed by optical microscopy and profilometer.

Název v anglickém jazyce

Optical PMMA Waveguides Fabricated by Modification of Refractive Index Applying Electric Field

Popis výsledku anglicky

In this paper, we describe results of our recent experiments on electric field assisted patterning of thin polymethylmethacrylate (PMMA) layers. Micro-sized patterns were created on thin PMMA films by the effect of external electric field, perpendicularto the film surface. The PMMA film, prepared by spin-coating onto Si or Si/SiO2 wafer, was heated to the fluid temperature (275°C) and a linear pattern was created by the effect of electric field produced by a strip electrode. The dependence of the formand size of the created patterns on the intensity of the electric field, exposure time and initial film thickness was examined. Wave guiding properties were analyzed by mode spectroscopy, optical losses were measured by dispersive method and the createdpatterns were analyzed by optical microscopy and profilometer.

Druh

D - Stať ve sborníku

CEP obor

JA - Elektronika a optoelektronika, elektrotechnika

OECD FORD obor

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Projekt

<a href="/cs/project/GP102%2F09%2FP104" target="_blank" >GP102/09/P104: Nové polymerní optické integrované komponenty pro fotonické aplikace</a><br>

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2010

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Electronic Devices and Systems, IMAPS CS International Conference 2010 Proceedings

ISBN

978-80-214-4138-5

ISSN

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e-ISSN

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Počet stran výsledku

6

Strana od-do

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Název nakladatele

VUT v Brně, FEI

Místo vydání

Brno

Místo konání akce

Brno

Datum konání akce

1. 9. 2010

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

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