TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F12%3A00196699" target="_blank" >RIV/68407700:21230/12:00196699 - isvavai.cz</a>

Výsledek na webu

<a href="http://download.springer.com/static/pdf/372/art%253A10.1007%252Fs11090-012-9401-0.pdf?auth66=1351696285_b7ae346d64f3dc0c16f3f2273f03605b&ext=.pdf" target="_blank" >http://download.springer.com/static/pdf/372/art%253A10.1007%252Fs11090-012-9401-0.pdf?auth66=1351696285_b7ae346d64f3dc0c16f3f2273f03605b&ext=.pdf</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/s11090-012-9401-0" target="_blank" >10.1007/s11090-012-9401-0</a>

Jazyk výsledku

angličtina

Název v původním jazyce

TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma

Popis výsledku v původním jazyce

The plasma enhanced chemical vapour deposition method applying atmospheric dielectric barrier discharge (ADBD) plasma was used for TiOx thin films deposition employing titanium (IV) isopropoxide and oxygen as reactants, and argon as a working gas. ADBD was operated in the filamentary mode. The films were deposited on glass. The films0 chemical composition, surface topography, wettability and aging were analysed, particularly the dependence between precursor and reactant concentration in the discharge atmosphere and its impact on TiOx films properties. Titanium in films near the surface area was oxidized, the dominating species being TiO2 and substoichiometric titanium oxides. The films exhibited contamination with carbon, as a result of atmospheric oxygen and carbon dioxide reactions with radicals in films. No relevant difference of the film surface due to oxygen concentration inside the reactor was determined. The films were hydrophilic immediately after deposition, afterwards their w

Název v anglickém jazyce

TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma

Popis výsledku anglicky

The plasma enhanced chemical vapour deposition method applying atmospheric dielectric barrier discharge (ADBD) plasma was used for TiOx thin films deposition employing titanium (IV) isopropoxide and oxygen as reactants, and argon as a working gas. ADBD was operated in the filamentary mode. The films were deposited on glass. The films0 chemical composition, surface topography, wettability and aging were analysed, particularly the dependence between precursor and reactant concentration in the discharge atmosphere and its impact on TiOx films properties. Titanium in films near the surface area was oxidized, the dominating species being TiO2 and substoichiometric titanium oxides. The films exhibited contamination with carbon, as a result of atmospheric oxygen and carbon dioxide reactions with radicals in films. No relevant difference of the film surface due to oxygen concentration inside the reactor was determined. The films were hydrophilic immediately after deposition, afterwards their w

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

PLASMA CHEMISTRY AND PLASMA PROCESSING

ISSN

0272-4324

e-ISSN

—

Svazek periodika

32

Číslo periodika v rámci svazku

146

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

11

Strana od-do

1215-1225

Kód UT WoS článku

000310321800007

EID výsledku v databázi Scopus

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