Evaluation of bias voltage-dependent mechanical properties of amorphous TiSi2 thin films on PEEK by nano-characterization techniques

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F21%3A00346658" target="_blank" >RIV/68407700:21230/21:00346658 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2021.126859" target="_blank" >https://doi.org/10.1016/j.surfcoat.2021.126859</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2021.126859" target="_blank" >10.1016/j.surfcoat.2021.126859</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Evaluation of bias voltage-dependent mechanical properties of amorphous TiSi2 thin films on PEEK by nano-characterization techniques

Popis výsledku v původním jazyce

Thin films on PEEK have been designing by magnetron sputtering, using bias voltages ranging from -31 to -157 V. The X-ray diffraction and EDX show how the amorphous films resulting have an elemental composition very close to the stoichiometry TiSi2. The AFM and SEM performed on top and cross-section, respectively, of film reveal a smooth and uniform surface, free of pores and cracks, and a compact microstructure. The evaluation of the resolved shear stress, yield strength, hardness, scratch resistance, and fracture toughness show how these values increase in the TiSi2/PEEK system as the bias voltage increase. The development of these hard and tough thin films has enabled the fracture toughness achieved by the TiSi2/PEEK system increase when a bias voltage equal to or higher than -108 V is used during the deposition process. For these bias conditions, the compressive residual stresses generated are large enough to prevent crack nucleation. The increase of the crack resistance gives as a result that KI reaches values above 32 MPa*m1/2. This value is much greater than those values corresponding to the classic ceramic coatings, such as Al2O3 (4.6 MPa*m1/2) and ZrO2 (7.6 MPa*m1/2).

Název v anglickém jazyce

Evaluation of bias voltage-dependent mechanical properties of amorphous TiSi2 thin films on PEEK by nano-characterization techniques

Popis výsledku anglicky

Thin films on PEEK have been designing by magnetron sputtering, using bias voltages ranging from -31 to -157 V. The X-ray diffraction and EDX show how the amorphous films resulting have an elemental composition very close to the stoichiometry TiSi2. The AFM and SEM performed on top and cross-section, respectively, of film reveal a smooth and uniform surface, free of pores and cracks, and a compact microstructure. The evaluation of the resolved shear stress, yield strength, hardness, scratch resistance, and fracture toughness show how these values increase in the TiSi2/PEEK system as the bias voltage increase. The development of these hard and tough thin films has enabled the fracture toughness achieved by the TiSi2/PEEK system increase when a bias voltage equal to or higher than -108 V is used during the deposition process. For these bias conditions, the compressive residual stresses generated are large enough to prevent crack nucleation. The increase of the crack resistance gives as a result that KI reaches values above 32 MPa*m1/2. This value is much greater than those values corresponding to the classic ceramic coatings, such as Al2O3 (4.6 MPa*m1/2) and ZrO2 (7.6 MPa*m1/2).

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GP14-32801P" target="_blank" >GP14-32801P: Nový způsob přípravy metalických vrstev pro aplikace v medicíně</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

1879-3347

Svazek periodika

409

Číslo periodika v rámci svazku

March

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

10

Strana od-do

—

Kód UT WoS článku

000654045600048

EID výsledku v databázi Scopus

2-s2.0-85099810229