Direct Growth of Sub-Micron Diamond Structures

Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F12%3A00200419" target="_blank" >RIV/68407700:21340/12:00200419 - isvavai.cz</a>
Výsledek na webu
<a href="http://dx.doi.org/10.1016/j.vacuum.2011.08.011" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2011.08.011</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2011.08.011" target="_blank" >10.1016/j.vacuum.2011.08.011</a>

Jazyk výsledku
angličtina
Název v původním jazyce
Direct Growth of Sub-Micron Diamond Structures
Popis výsledku v původním jazyce
By employing optical and electron beam lithography, micrometer and sub-micrometer wide polymer structures were fabricated on a diamond nano-particle layer. After selective removal of the diamond nano-particles (seeds) in the buffer oxide etchant, all samples were exposed to microwave plasma-assisted chemical vapor deposition. Well-defined diamond channels (in widths from 5 ?m down to 250 nm) were realized. The advantages and limitations of the wet treatment process and the lithographical polymer application as a masking material are discussed in this study.
Název v anglickém jazyce
Direct Growth of Sub-Micron Diamond Structures
Popis výsledku anglicky
By employing optical and electron beam lithography, micrometer and sub-micrometer wide polymer structures were fabricated on a diamond nano-particle layer. After selective removal of the diamond nano-particles (seeds) in the buffer oxide etchant, all samples were exposed to microwave plasma-assisted chemical vapor deposition. Well-defined diamond channels (in widths from 5 ?m down to 250 nm) were realized. The advantages and limitations of the wet treatment process and the lithographical polymer application as a masking material are discussed in this study.

Rok uplatnění
2012
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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