EUV source at Hilase: The state of the art

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F19%3A00339583" target="_blank" >RIV/68407700:21340/19:00339583 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.17973/MMSJ.2019_12_2018131" target="_blank" >https://doi.org/10.17973/MMSJ.2019_12_2018131</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.17973/MMSJ.2019_12_2018131" target="_blank" >10.17973/MMSJ.2019_12_2018131</a>

Jazyk výsledku

angličtina

Název v původním jazyce

EUV source at Hilase: The state of the art

Popis výsledku v původním jazyce

An overview of the Extreme Ultraviolet (EUV) source to be constructed in the frame of the Czech national R&D project HiLASE (High average power pulsed LASErs) is presented. The HiLASE EUV source will be devoted to industrial and medical applications, as well as to fundamental studies (such as the chemistry of polymers). This wide variety of different applications depends on the possibility of targeting different EUV wavelengths (namely 13.5 nm and the water window range, 2.33-4.40 nm), which is insured by the fact that the projected table top EUV source can work on multiple different HiLASE lasers: The cryogenically cooled, Yb:YAG slab high energy laser system and the thin-disk, high repetition rate picosecond laser systems. HiLASE EUV source is intended as a user oriented device based on a laser plasma source with single stream gas-puff target.

Název v anglickém jazyce

EUV source at Hilase: The state of the art

Popis výsledku anglicky

An overview of the Extreme Ultraviolet (EUV) source to be constructed in the frame of the Czech national R&D project HiLASE (High average power pulsed LASErs) is presented. The HiLASE EUV source will be devoted to industrial and medical applications, as well as to fundamental studies (such as the chemistry of polymers). This wide variety of different applications depends on the possibility of targeting different EUV wavelengths (namely 13.5 nm and the water window range, 2.33-4.40 nm), which is insured by the fact that the projected table top EUV source can work on multiple different HiLASE lasers: The cryogenically cooled, Yb:YAG slab high energy laser system and the thin-disk, high repetition rate picosecond laser systems. HiLASE EUV source is intended as a user oriented device based on a laser plasma source with single stream gas-puff target.

Druh

J_SC - Článek v periodiku v databázi SCOPUS

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

<a href="/cs/project/LTT17015" target="_blank" >LTT17015: Výzkum v rámci Mezinárodního centra hustého magnetizovaného plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

MM Science Journal

ISSN

1803-1269

e-ISSN

1805-0476

Svazek periodika

2019

Číslo periodika v rámci svazku

December

Stát vydavatele periodika

CZ - Česká republika

Počet stran výsledku

4

Strana od-do

3406-3409

Kód UT WoS článku

—

EID výsledku v databázi Scopus

2-s2.0-85076619255