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Refractory Plasmonics of Reactively Sputtered Hafnium Nitride Nanoparticles: Pushing Limits

Identifikátory výsledku

  • Kód výsledku v IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2FCZ______%3A_____%2F24%3AN0000073" target="_blank" >RIV/CZ______:_____/24:N0000073 - isvavai.cz</a>

  • Nalezeny alternativní kódy

    RIV/00216208:11320/24:10486203 RIV/68378271:_____/24:00638162

  • Výsledek na webu

    <a href="https://onlinelibrary.wiley.com/doi/full/10.1002/adom.202302715" target="_blank" >https://onlinelibrary.wiley.com/doi/full/10.1002/adom.202302715</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1002/adom.202302715" target="_blank" >10.1002/adom.202302715</a>

Alternativní jazyky

  • Jazyk výsledku

    angličtina

  • Název v původním jazyce

    Refractory Plasmonics of Reactively Sputtered Hafnium Nitride Nanoparticles: Pushing Limits

  • Popis výsledku v původním jazyce

    High-temperature plasmonics deals with optically active nanostructures that can withstand high temperatures. A conventional approach relying on standalone noble metal nanoparticles fails to deliver refractory plasmonic nanomaterials, and an alternative route envisions metal nitrides. The main challenge remains the development of advanced synthesis techniques and the insight into thermal stability under real-life application conditions. Here, hafnium nitride nanoparticles (HfN NPs) can be produced by gas aggregation using reactive magnetron sputtering, a technique with a small environmental footprint are shown. As-deposited NPs are of 10 nm mean size and consist of stoichiometric, crystalline fcc HfN. They are characterized by optical absorption below 500 nm caused by interband transitions and in the red/near-infrared (NIR) region due to intraband transitions and localized surface plasmon resonance (LSPR). The optical response can be engineered by tuning the NP composition as predicted by finite-difference time-domain (FDTD) calculations. Going beyond the state-of-the-art, the HfN NP thermal stability is focued under ultrahigh vacuum (UHV) and in air. During UHV annealing to 850 degrees C, the NPs retain their morphology, chemical and optical properties, which makes them attractive in space mission and other applications. During air annealing to 800 degrees C, HfN NPs remain stable until 250 degrees C, which sets a limit for air-mediated use. Hafnium nitride nanoparticles (NPs) are synthesized via reactive magnetron sputtering, with optical response modulation by adjusting the chemical composition. The NP refractory characteristics are examined under ultrahigh vacuum and in air using in situ techniques, tracking thermally-induced changes in NP chemistry, microstructure, and optical properties. The HfN NPs remain stable up to 850 degrees C in vacuum and 250 degrees C in air. image

  • Název v anglickém jazyce

    Refractory Plasmonics of Reactively Sputtered Hafnium Nitride Nanoparticles: Pushing Limits

  • Popis výsledku anglicky

    High-temperature plasmonics deals with optically active nanostructures that can withstand high temperatures. A conventional approach relying on standalone noble metal nanoparticles fails to deliver refractory plasmonic nanomaterials, and an alternative route envisions metal nitrides. The main challenge remains the development of advanced synthesis techniques and the insight into thermal stability under real-life application conditions. Here, hafnium nitride nanoparticles (HfN NPs) can be produced by gas aggregation using reactive magnetron sputtering, a technique with a small environmental footprint are shown. As-deposited NPs are of 10 nm mean size and consist of stoichiometric, crystalline fcc HfN. They are characterized by optical absorption below 500 nm caused by interband transitions and in the red/near-infrared (NIR) region due to intraband transitions and localized surface plasmon resonance (LSPR). The optical response can be engineered by tuning the NP composition as predicted by finite-difference time-domain (FDTD) calculations. Going beyond the state-of-the-art, the HfN NP thermal stability is focued under ultrahigh vacuum (UHV) and in air. During UHV annealing to 850 degrees C, the NPs retain their morphology, chemical and optical properties, which makes them attractive in space mission and other applications. During air annealing to 800 degrees C, HfN NPs remain stable until 250 degrees C, which sets a limit for air-mediated use. Hafnium nitride nanoparticles (NPs) are synthesized via reactive magnetron sputtering, with optical response modulation by adjusting the chemical composition. The NP refractory characteristics are examined under ultrahigh vacuum and in air using in situ techniques, tracking thermally-induced changes in NP chemistry, microstructure, and optical properties. The HfN NPs remain stable up to 850 degrees C in vacuum and 250 degrees C in air. image

Klasifikace

  • Druh

    J<sub>imp</sub> - Článek v periodiku v databázi Web of Science

  • CEP obor

  • OECD FORD obor

    10306 - Optics (including laser optics and quantum optics)

Návaznosti výsledku

  • Projekt

    Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

  • Návaznosti

    V - Vyzkumna aktivita podporovana z jinych verejnych zdroju

Ostatní

  • Rok uplatnění

    2024

  • Kód důvěrnosti údajů

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Údaje specifické pro druh výsledku

  • Název periodika

    Advanced Optical Materials

  • ISSN

    2195-1071

  • e-ISSN

  • Svazek periodika

    12

  • Číslo periodika v rámci svazku

    13

  • Stát vydavatele periodika

    DE - Spolková republika Německo

  • Počet stran výsledku

    13

  • Strana od-do

    2302715 (1 - 13)

  • Kód UT WoS článku

    001175715000001

  • EID výsledku v databázi Scopus

    2-s2.0-85186232508