6-axis interferometric coordinates measurement system for nanometrology

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00177016%3A_____%2F14%3A%230001042" target="_blank" >RIV/00177016:_____/14:#0001042 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1117/12.2054802" target="_blank" >http://dx.doi.org/10.1117/12.2054802</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1117/12.2054802" target="_blank" >10.1117/12.2054802</a>

Jazyk výsledku

angličtina

Název v původním jazyce

6-axis interferometric coordinates measurement system for nanometrology

Popis výsledku v původním jazyce

We present an overview of approaches to the design of nanometrology coordinates measuring setup with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a nanopositioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro- and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The practical measurement results of active compensation system for positioning angle errors suppression are presented as well as the analysis of overall achievable parameters. The system is being developed in cooperation with

Název v anglickém jazyce

6-axis interferometric coordinates measurement system for nanometrology

Popis výsledku anglicky

We present an overview of approaches to the design of nanometrology coordinates measuring setup with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a nanopositioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro- and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The practical measurement results of active compensation system for positioning angle errors suppression are presented as well as the analysis of overall achievable parameters. The system is being developed in cooperation with

Druh

D - Stať ve sborníku

CEP obor

JB - Senzory, čidla, měření a regulace

OECD FORD obor

—

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

PHOTONIC INSTRUMENTATION ENGINEERING

ISBN

978-0-8194-9905-9

ISSN

0277-786X

e-ISSN

—

Počet stran výsledku

1

Strana od-do

—

Název nakladatele

SPIE-INT SOC OPTICAL ENGINEERING

Místo vydání

USA

Místo konání akce

San Francisco, CA

Datum konání akce

1. 1. 2014

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000337143700023