Algorithms for using silicon steps for scanning probe microscope evaluation

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00177016%3A_____%2F20%3AN0000045" target="_blank" >RIV/00177016:_____/20:N0000045 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216224:14740/20:00118376 RIV/00216305:26620/20:PU139266

Výsledek na webu

<a href="https://iopscience.iop.org/article/10.1088/1681-7575/ab9ad3" target="_blank" >https://iopscience.iop.org/article/10.1088/1681-7575/ab9ad3</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1681-7575/ab9ad3" target="_blank" >10.1088/1681-7575/ab9ad3</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Algorithms for using silicon steps for scanning probe microscope evaluation

Popis výsledku v původním jazyce

The 2019 update to theMise en Pratique for the metre adopted the lattice parameter of silicon as a secondary realisation of the metre for dimensional nanometrology. One route for this realisation is the use of amphitheatre like monoatomic steps of silicon. In response, in this paper we present new algorithms for one- and two-dimensional analysis of atomic force microscope images of these large area atomic terraces on the surface of silicon. These algorithms can be used to determine the spacing between the steps and identify errors in AFM scanning systems. Since the vertical separation of the steps is of the same order of magnitude as many errors associated with AFMs great care is needed in processing AFM measurements of the steps. However, using the algorithms presented in this paper, corrections may be made for AFM scanner bow and waviness as well as taking into account the edge effects on the silicon steps. Applicability of the data processing methods is demonstrated on data sets obtained from various instruments. Aspects of steps arrangement on surface and its impact on uncertainties are discussed as well.

Název v anglickém jazyce

Algorithms for using silicon steps for scanning probe microscope evaluation

Popis výsledku anglicky

The 2019 update to theMise en Pratique for the metre adopted the lattice parameter of silicon as a secondary realisation of the metre for dimensional nanometrology. One route for this realisation is the use of amphitheatre like monoatomic steps of silicon. In response, in this paper we present new algorithms for one- and two-dimensional analysis of atomic force microscope images of these large area atomic terraces on the surface of silicon. These algorithms can be used to determine the spacing between the steps and identify errors in AFM scanning systems. Since the vertical separation of the steps is of the same order of magnitude as many errors associated with AFMs great care is needed in processing AFM measurements of the steps. However, using the algorithms presented in this paper, corrections may be made for AFM scanner bow and waviness as well as taking into account the edge effects on the silicon steps. Applicability of the data processing methods is demonstrated on data sets obtained from various instruments. Aspects of steps arrangement on surface and its impact on uncertainties are discussed as well.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

21100 - Other engineering and technologies

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Metrologia

ISSN

0026-1394

e-ISSN

1681-7575

Svazek periodika

57

Číslo periodika v rámci svazku

6

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

14

Strana od-do

—

Kód UT WoS článku

000580451200001

EID výsledku v databázi Scopus

2-s2.0-85094871021