Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F11%3A10107125" target="_blank" >RIV/00216208:11320/11:10107125 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/11:00367262

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2010.10.030" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2010.10.030</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2010.10.030" target="_blank" >10.1016/j.surfcoat.2010.10.030</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system

Popis výsledku v původním jazyce

Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1-25 kHz) and the duty cycles (20-90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100-800 mA) and the pressure in the condensation tube (25-90 Pa) is also investigated. The cluster mass is determined by a quadrupole mass filter in the aggregation tube, and the cluster size by atomic force microscopy (AFM) imaging of deposited clusters. For all preparation conditions, the cluster mass shows a log-normal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 10^(5) amu, or cluster diameter 8-10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critica

Název v anglickém jazyce

Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system

Popis výsledku anglicky

Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1-25 kHz) and the duty cycles (20-90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100-800 mA) and the pressure in the condensation tube (25-90 Pa) is also investigated. The cluster mass is determined by a quadrupole mass filter in the aggregation tube, and the cluster size by atomic force microscopy (AFM) imaging of deposited clusters. For all preparation conditions, the cluster mass shows a log-normal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 10^(5) amu, or cluster diameter 8-10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critica

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

—

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

205

Číslo periodika v rámci svazku

8

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

2755-2762

Kód UT WoS článku

000286905100009

EID výsledku v databázi Scopus

—