The Computational Simulation of the Positive Ion Propagation to Uneven Substrates

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F11%3A10109812" target="_blank" >RIV/00216208:11320/11:10109812 - isvavai.cz</a>

Výsledek na webu

<a href="http://www.mff.cuni.cz/veda/konference/wds/proc/pdf11/WDS11_219_f2_Hruby.pdf" target="_blank" >http://www.mff.cuni.cz/veda/konference/wds/proc/pdf11/WDS11_219_f2_Hruby.pdf</a>

DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

The Computational Simulation of the Positive Ion Propagation to Uneven Substrates

Popis výsledku v původním jazyce

The low-temperature plasma is commonly used to treat the surfaces of a wide range of substrates. The deposition of layers on the surfaces of conductive substrates may be achieved by various ways. In comparison with neutral atom deposition, the use of ions has got considerable advantages. The energy of ions and the flux to the substrate can be controlled by the voltage bias and the pressure. in this contribution, the propagation of ions from low-temperature plasma to substrates with uneven surfaces is studied by means of computational simulations. Instead of simulating the whole system of discharge, sputtering and deposition, this study is devoted to the transport of ions to a complex substrate, which demands the fully three-dimensional approach, independently of the source of plasma. The computational simulations are based on a hybrid model which consists of a fluid and a particle part trying to take advantage from both of them. The fluid part reaches the global results in a short time

Název v anglickém jazyce

The Computational Simulation of the Positive Ion Propagation to Uneven Substrates

Popis výsledku anglicky

The low-temperature plasma is commonly used to treat the surfaces of a wide range of substrates. The deposition of layers on the surfaces of conductive substrates may be achieved by various ways. In comparison with neutral atom deposition, the use of ions has got considerable advantages. The energy of ions and the flux to the substrate can be controlled by the voltage bias and the pressure. in this contribution, the propagation of ions from low-temperature plasma to substrates with uneven surfaces is studied by means of computational simulations. Instead of simulating the whole system of discharge, sputtering and deposition, this study is devoted to the transport of ions to a complex substrate, which demands the fully three-dimensional approach, independently of the source of plasma. The computational simulations are based on a hybrid model which consists of a fluid and a particle part trying to take advantage from both of them. The fluid part reaches the global results in a short time

Druh

D - Stať ve sborníku

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GD202%2F08%2FH057" target="_blank" >GD202/08/H057: Moderní trendy ve fyzice plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

WDS'11 Proceedings of Contributed Papers: Part II ? Physics of Plasmas and Ionized Media

ISBN

978-80-7378-185-9

ISSN

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e-ISSN

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Počet stran výsledku

5

Strana od-do

115-119

Název nakladatele

Matfyzpress

Místo vydání

Praha

Místo konání akce

Praha

Datum konání akce

31. 5. 2011

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

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