Role of oxygen admixture in stabilizing TiO (x) nanoparticle deposition from a gas aggregation source

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F13%3A10191040" target="_blank" >RIV/00216208:11320/13:10191040 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1007/s11051-013-2125-0" target="_blank" >http://dx.doi.org/10.1007/s11051-013-2125-0</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/s11051-013-2125-0" target="_blank" >10.1007/s11051-013-2125-0</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Role of oxygen admixture in stabilizing TiO (x) nanoparticle deposition from a gas aggregation source

Popis výsledku v původním jazyce

For the use of a gas aggregation cluster source a high and stable deposition rate is desired. For many metals, nanoparticle formation is enhanced by admixture of reactive gases. Here, the role of reactive gas admixtures on the nanoparticle deposition rates is investigated for the case of reactive direct current magnetron sputtering of Ti in a gas aggregation chamber. The results show that, at low working gas (argon) pressures, stable cluster deposition at high rates can only be achieved for admixtures with a very narrow oxygen flow range. At higher pressures, stable deposition can be observed only after an intermediate maximum rate has been crossed or a stable deposition rate is not reached at all. For the different sputtering conditions, the partial pressure of oxygen was monitored with a mass spectrometer. The results are explained in terms of the competing roles of oxygen in cluster nucleation as well as in target poisoning. The cluster size distributions for different conditions we

Název v anglickém jazyce

Role of oxygen admixture in stabilizing TiO (x) nanoparticle deposition from a gas aggregation source

Popis výsledku anglicky

For the use of a gas aggregation cluster source a high and stable deposition rate is desired. For many metals, nanoparticle formation is enhanced by admixture of reactive gases. Here, the role of reactive gas admixtures on the nanoparticle deposition rates is investigated for the case of reactive direct current magnetron sputtering of Ti in a gas aggregation chamber. The results show that, at low working gas (argon) pressures, stable cluster deposition at high rates can only be achieved for admixtures with a very narrow oxygen flow range. At higher pressures, stable deposition can be observed only after an intermediate maximum rate has been crossed or a stable deposition rate is not reached at all. For the different sputtering conditions, the partial pressure of oxygen was monitored with a mass spectrometer. The results are explained in terms of the competing roles of oxygen in cluster nucleation as well as in target poisoning. The cluster size distributions for different conditions we

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Nanoparticle Research

ISSN

1388-0764

e-ISSN

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Svazek periodika

15

Číslo periodika v rámci svazku

12

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

11

Strana od-do

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Kód UT WoS článku

000327525400001

EID výsledku v databázi Scopus

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