The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319538" target="_blank" >RIV/00216208:11320/15:10319538 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035025" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/3/035025</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0963-0252/24/3/035025" target="_blank" >10.1088/0963-0252/24/3/035025</a>

Jazyk výsledku

angličtina

Název v původním jazyce

The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime

Popis výsledku v původním jazyce

TiO2 nanoparticles are being investigated in this work. Nanoparticles were obtained in Ar plasma on monocrystaline Si(111) substrate by means of a gas-phase deposition using a low pressure hollow cathode plasma jet. The material of the cathode is pure titanium. Oxygen was introduced separately from argon through an inlet in the chamber. The nanoparticle growth mechanism is qualitatively discussed. The morphology of the surfaces of thin films was investigated by an atomic force microscope. The chemical composition of the thin films was investigated by means of an energy-dispersive x-ray analysis and x-ray photoelectron spectroscopy. A cylindrical Langmuir probe and a fiber optic thermometer was used for measurements of plasma parameters and neutral gastemperature respectively. The relationship between plasma parameters and the films' morphology is particularly explained.

Název v anglickém jazyce

The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime

Popis výsledku anglicky

TiO2 nanoparticles are being investigated in this work. Nanoparticles were obtained in Ar plasma on monocrystaline Si(111) substrate by means of a gas-phase deposition using a low pressure hollow cathode plasma jet. The material of the cathode is pure titanium. Oxygen was introduced separately from argon through an inlet in the chamber. The nanoparticle growth mechanism is qualitatively discussed. The morphology of the surfaces of thin films was investigated by an atomic force microscope. The chemical composition of the thin films was investigated by means of an energy-dispersive x-ray analysis and x-ray photoelectron spectroscopy. A cylindrical Langmuir probe and a fiber optic thermometer was used for measurements of plasma parameters and neutral gastemperature respectively. The relationship between plasma parameters and the films' morphology is particularly explained.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GA15-00863S" target="_blank" >GA15-00863S: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace</a><br>

Návaznosti

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

—

Svazek periodika

24

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

10

Strana od-do

—

Kód UT WoS článku

000356857800050

EID výsledku v databázi Scopus

2-s2.0-84937560008