High Power Impulse Magnetron Sputtering: Current Research and Diagnostic

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F19%3A10406085" target="_blank" >RIV/00216208:11320/19:10406085 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.mff.cuni.cz/veda/konference/wds/proc/pdf19/WDS19_12_f2_Kapran.pdf" target="_blank" >https://www.mff.cuni.cz/veda/konference/wds/proc/pdf19/WDS19_12_f2_Kapran.pdf</a>

DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

High Power Impulse Magnetron Sputtering: Current Research and Diagnostic

Popis výsledku v původním jazyce

High Power Impulse Magnetron Sputtering or HiPIMS is a relatively recent sputtering technology used for the physical vapor deposition of thin film coatings based upon magnetron sputtering with a high voltagecurrency signt pulsed power source. Interest in the method of high-power impulse sputtering has grown steadily. Therefore, the task of first priority is to study the results of work already available in the scientific world in the field of high-power magnetron sputtering to determine the level of knowledge of this direction, as well as to identify the main trends in the development of new coating methods.This literature review outlines the state of the art in HiPIMS, as well as the foundations for more detail research of physical processes of high-power sputtering. The motivation for this review is to provide a brief summary of the HiPIMS technology, its history, its underlying physical mechanisms and diagnostic.

Název v anglickém jazyce

High Power Impulse Magnetron Sputtering: Current Research and Diagnostic

Popis výsledku anglicky

High Power Impulse Magnetron Sputtering or HiPIMS is a relatively recent sputtering technology used for the physical vapor deposition of thin film coatings based upon magnetron sputtering with a high voltagecurrency signt pulsed power source. Interest in the method of high-power impulse sputtering has grown steadily. Therefore, the task of first priority is to study the results of work already available in the scientific world in the field of high-power magnetron sputtering to determine the level of knowledge of this direction, as well as to identify the main trends in the development of new coating methods.This literature review outlines the state of the art in HiPIMS, as well as the foundations for more detail research of physical processes of high-power sputtering. The motivation for this review is to provide a brief summary of the HiPIMS technology, its history, its underlying physical mechanisms and diagnostic.

Druh

D - Stať ve sborníku

CEP obor

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OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/GA19-00579S" target="_blank" >GA19-00579S: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

WDS&apos;19 Proceedings of Contributed Papers — Physics

ISBN

978-80-7378-409-6

ISSN

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e-ISSN

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Počet stran výsledku

6

Strana od-do

66-71

Název nakladatele

Matfyzpress

Místo vydání

Praha

Místo konání akce

Praha

Datum konání akce

4. 6. 2019

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

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