On the Ni-Ion release rate from surfaces of binary NiTi shape memory alloys
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14110%2F18%3A00100744" target="_blank" >RIV/00216224:14110/18:00100744 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/68081723:_____/18:00485204
Výsledek na webu
<a href="http://dx.doi.org/10.1016/j.apsusc.2017.08.235" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2017.08.235</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2017.08.235" target="_blank" >10.1016/j.apsusc.2017.08.235</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
On the Ni-Ion release rate from surfaces of binary NiTi shape memory alloys
Popis výsledku v původním jazyce
The study is focused on Ni-ion release rates from NiTi surfaces exposed in the cell culture media and human vascular endothelial cell (HUVEC) culture environments. The NiTi surface layers situated in the depth of 70 um below a NiTi oxide scale are affected by interactions between the NiTi alloys and the bio-environments. The finding was proved with use of inductively coupled plasma mass spectrometry and electron microscopy experiments. As the exclusive factor controlling the Ni-ion release rates was not only thicknesses of the oxide scale, but also the passivation depth, which was two-fold larger. Our experimental data strongly suggested that some other factors, in addition to the Ni concentration in the oxide scale, admittedly hydrogen soaking deep below the oxide scale, must be taken into account in order to rationalize the concentrations of Ni-ions released into the bio-environments. The suggested role of hydrogen as the surface passivation agent is also in line with the fact that the Ni-ion release rates considerably decrease in NiTi samples that were annealed in controlled hydrogen atmospheres prior to bio-environmental exposures.
Název v anglickém jazyce
On the Ni-Ion release rate from surfaces of binary NiTi shape memory alloys
Popis výsledku anglicky
The study is focused on Ni-ion release rates from NiTi surfaces exposed in the cell culture media and human vascular endothelial cell (HUVEC) culture environments. The NiTi surface layers situated in the depth of 70 um below a NiTi oxide scale are affected by interactions between the NiTi alloys and the bio-environments. The finding was proved with use of inductively coupled plasma mass spectrometry and electron microscopy experiments. As the exclusive factor controlling the Ni-ion release rates was not only thicknesses of the oxide scale, but also the passivation depth, which was two-fold larger. Our experimental data strongly suggested that some other factors, in addition to the Ni concentration in the oxide scale, admittedly hydrogen soaking deep below the oxide scale, must be taken into account in order to rationalize the concentrations of Ni-ions released into the bio-environments. The suggested role of hydrogen as the surface passivation agent is also in line with the fact that the Ni-ion release rates considerably decrease in NiTi samples that were annealed in controlled hydrogen atmospheres prior to bio-environmental exposures.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
30105 - Physiology (including cytology)
Návaznosti výsledku
Projekt
<a href="/cs/project/GA15-16336S" target="_blank" >GA15-16336S: Intersticiální příměsi v tvarově-paměťových slitinách na bázi NiTi</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2018
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Applied Surface Science
ISSN
0169-4332
e-ISSN
1873-5584
Svazek periodika
427
Číslo periodika v rámci svazku
1 January 2018
Stát vydavatele periodika
NL - Nizozemsko
Počet stran výsledku
10
Strana od-do
434-443
Kód UT WoS článku
000415219100053
EID výsledku v databázi Scopus
2-s2.0-85028989362