Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F01%3A00004312" target="_blank" >RIV/00216224:14310/01:00004312 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216305:26210/01:PU20859

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances

Popis výsledku v původním jazyce

In this contribution a new efficient modification of the method enabling us to perform the optical characterization of non-absorbing and weakly absorbing thin films without using the absolute values of the reflectances measured will be presented. Namely,this modification is based on determining the values of the wavelengths corresponding to the points of touching the spectral dependences of the reflectances of the studied films measured for several angles of incidence with the envelopes of maxima and minima of these spectral dependences. By means of combining the explicit formulae containing the wavelengths mentioned and the suitable iteration procedure one can evaluate the values of the thicknesses and spectral dependences of the refractive indices of the films analyzed in both reliable and precise ways. This fact will be demonstrated through the optical characterization of non-absorbing films of silicon dioxide and weakly absorbing films of photoresist placed on

Název v anglickém jazyce

Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances

Popis výsledku anglicky

In this contribution a new efficient modification of the method enabling us to perform the optical characterization of non-absorbing and weakly absorbing thin films without using the absolute values of the reflectances measured will be presented. Namely,this modification is based on determining the values of the wavelengths corresponding to the points of touching the spectral dependences of the reflectances of the studied films measured for several angles of incidence with the envelopes of maxima and minima of these spectral dependences. By means of combining the explicit formulae containing the wavelengths mentioned and the suitable iteration procedure one can evaluate the values of the thicknesses and spectral dependences of the refractive indices of the films analyzed in both reliable and precise ways. This fact will be demonstrated through the optical characterization of non-absorbing films of silicon dioxide and weakly absorbing films of photoresist placed on

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2001

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

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Svazek periodika

61

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

5

Strana od-do

285

Kód UT WoS článku

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EID výsledku v databázi Scopus

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