Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F09%3A00029369" target="_blank" >RIV/00216224:14310/09:00029369 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?

Popis výsledku v původním jazyce

Reactive sputtering controlled by flow of the reactive gas suffers from problems in processing stability caused by an abrupt transition between the metallic and the compound mode. During this transition many important parameters including target composition and gas composition change dramatically. A sensitive monitoring method is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages. Voltage waveforms recorded from the cathode and from an uncompensated probe were analyzed. Uncompensated probe exhibited higher sensitivity significantly better than sensitivity of any other known electrical method used for the control of magnetron sputtering process. Moreover, some particular experiments show that the changes in amplitudes of the harmonics by the transition are due to the changes of the target composition rather than due the change of the gas composition.

Název v anglickém jazyce

Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?

Popis výsledku anglicky

Reactive sputtering controlled by flow of the reactive gas suffers from problems in processing stability caused by an abrupt transition between the metallic and the compound mode. During this transition many important parameters including target composition and gas composition change dramatically. A sensitive monitoring method is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages. Voltage waveforms recorded from the cathode and from an uncompensated probe were analyzed. Uncompensated probe exhibited higher sensitivity significantly better than sensitivity of any other known electrical method used for the control of magnetron sputtering process. Moreover, some particular experiments show that the changes in amplitudes of the harmonics by the transition are due to the changes of the target composition rather than due the change of the gas composition.

Druh

D - Stať ve sborníku

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GP202%2F08%2FP038" target="_blank" >GP202/08/P038: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev</a><br>

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2009

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts

ISBN

978-80-214-3875-0

ISSN

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e-ISSN

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Počet stran výsledku

1

Strana od-do

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Název nakladatele

VUT Brno

Místo vydání

Brno

Místo konání akce

Blansko

Datum konání akce

1. 1. 2009

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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