Measurement of plasma potential waveform in capacitive discharge

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F09%3A00049592" target="_blank" >RIV/00216224:14310/09:00049592 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Measurement of plasma potential waveform in capacitive discharge

Popis výsledku v původním jazyce

The uncompensated probe was used for measurement of plasma potential waveforms. A method is presented that enables calculation of probe sheath voltage and, consequently, enables to get the plasma potential waveform by means of probe measurements. The method was successfully tested in nitrogen plasma. In order to get reliable results the method requires knowledge of plasma parameters which can be measured by a compensated Langmuir probe. It was shown that the waveforms of plasma potential and probe voltage differ significantly. Therefore, the influence of the probe sheath voltage whose calculation is presented can not be neglected by measurement of the plasma potential. At low pressure, the plasma potential waveform contained high amount of higher harmonic frequencies that were ignited namely during the fast expansion of the sheath at the powered electrode.

Název v anglickém jazyce

Measurement of plasma potential waveform in capacitive discharge

Popis výsledku anglicky

The uncompensated probe was used for measurement of plasma potential waveforms. A method is presented that enables calculation of probe sheath voltage and, consequently, enables to get the plasma potential waveform by means of probe measurements. The method was successfully tested in nitrogen plasma. In order to get reliable results the method requires knowledge of plasma parameters which can be measured by a compensated Langmuir probe. It was shown that the waveforms of plasma potential and probe voltage differ significantly. Therefore, the influence of the probe sheath voltage whose calculation is presented can not be neglected by measurement of the plasma potential. At low pressure, the plasma potential waveform contained high amount of higher harmonic frequencies that were ignited namely during the fast expansion of the sheath at the powered electrode.

Druh

O - Ostatní výsledky

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GA202%2F07%2F1669" target="_blank" >GA202/07/1669: Depozice termomechanicky stabilních nanostrukturovaných diamantu-podobných tenkých vrstev ve dvojfrekvenčních kapacitních výbojích</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2009

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů