Probe technique for measurement of plasma potential waveform

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F17%3A00096609" target="_blank" >RIV/00216224:14310/17:00096609 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1088/1361-6595/aa6611" target="_blank" >http://dx.doi.org/10.1088/1361-6595/aa6611</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/aa6611" target="_blank" >10.1088/1361-6595/aa6611</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Probe technique for measurement of plasma potential waveform

Popis výsledku v původním jazyce

A method for measurement of plasma potential waveforms is presented that is based on measurement with a high-impedance probe and on an electric model of the sheath around the probe. The method was verified and compared with methods that were previously used for measurement of the temporal development of plasma potential during a RF period of capacitive discharges. Sensitivity of the method to the values of required input parameters (mean plasma potential value, electron concentration and temperature) was analyzed and it was found that with a lower precision the method can be used even without the knowledge of these input parameters. Finally, plasma potential waveforms were measured in a low-pressure capacitively coupled discharge. In agreement with theoretical models, generation of higher harmonic frequencies of plasma potential and their sensitivity to electron concentration were observed.

Název v anglickém jazyce

Probe technique for measurement of plasma potential waveform

Popis výsledku anglicky

A method for measurement of plasma potential waveforms is presented that is based on measurement with a high-impedance probe and on an electric model of the sheath around the probe. The method was verified and compared with methods that were previously used for measurement of the temporal development of plasma potential during a RF period of capacitive discharges. Sensitivity of the method to the values of required input parameters (mean plasma potential value, electron concentration and temperature) was analyzed and it was found that with a lower precision the method can be used even without the knowledge of these input parameters. Finally, plasma potential waveforms were measured in a low-pressure capacitively coupled discharge. In agreement with theoretical models, generation of higher harmonic frequencies of plasma potential and their sensitivity to electron concentration were observed.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

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OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/LO1411" target="_blank" >LO1411: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

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Svazek periodika

26

Číslo periodika v rámci svazku

5

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

8

Strana od-do

—

Kód UT WoS článku

000399736700001

EID výsledku v databázi Scopus

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