Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00057711" target="_blank" >RIV/00216224:14310/12:00057711 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment

Popis výsledku v původním jazyce

Two series of nc-TiC/a-C:H coatings with varying chemical composition were prepared using a deposition process consisting of titanium target sputtering in argon/acetylene atmosphere combined into a hybrid PVD-PECVD. The range of chemical compositions waschosen in order to achieve optimal hardness of the coatings ? from 30 at.% to 70 at.% Ti. The films were ~ 5 microns thick with 700 nm titanium interlayer to promote the adhesion of the coatings to industrially important substrates like cemented tungsten carbide and high speed steel. The different levels of ion bombardment were achieved by different magnetic fields on the cathode. A well-balanced magnetic field was used for low ion bombardment of the growing film and a strongly unbalanced magnetic field was used for high bombardment. We kept all other deposition parameters such as pressure and substrate temperature constant for both magnetic field configurations as to single out the effect of the ion bombardment on the properties of th

Název v anglickém jazyce

Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment

Popis výsledku anglicky

Two series of nc-TiC/a-C:H coatings with varying chemical composition were prepared using a deposition process consisting of titanium target sputtering in argon/acetylene atmosphere combined into a hybrid PVD-PECVD. The range of chemical compositions waschosen in order to achieve optimal hardness of the coatings ? from 30 at.% to 70 at.% Ti. The films were ~ 5 microns thick with 700 nm titanium interlayer to promote the adhesion of the coatings to industrially important substrates like cemented tungsten carbide and high speed steel. The different levels of ion bombardment were achieved by different magnetic fields on the cathode. A well-balanced magnetic field was used for low ion bombardment of the growing film and a strongly unbalanced magnetic field was used for high bombardment. We kept all other deposition parameters such as pressure and substrate temperature constant for both magnetic field configurations as to single out the effect of the ion bombardment on the properties of th

Druh

O - Ostatní výsledky

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů