Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F14%3A00073878" target="_blank" >RIV/00216224:14310/14:00073878 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices

Popis výsledku v původním jazyce

nc-TiC/a-C:H coatings consist of TiC crystallites embedded in an amorphous hydrogenated carbon matrix. Depending mainly on the chemical composition (ratio of Ti/C), the properties of these coatings can be tailored from hard coatings to tribological coatings, with low coefficients of friction and wear. However none of the major industrial coating centers offer this coating in their portfolio, probably because of the lack of the reliable deposition technology. In our research, we employed industrial PVD device of Platit equipped with a central titanium rotating cylindrical cathode. Titanium was sputtered in a mixture of argon and acetylene. When the acetylene supply was gradually increased, deposition process characteristics such as the cathode voltage and the total pressure in the deposition chamber underwent a sudden change. At critical acetylene supply, a sudden drop in the cathode voltage was observed, while before and after the drop, the cathode voltage evolved slowly.

Název v anglickém jazyce

Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices

Popis výsledku anglicky

nc-TiC/a-C:H coatings consist of TiC crystallites embedded in an amorphous hydrogenated carbon matrix. Depending mainly on the chemical composition (ratio of Ti/C), the properties of these coatings can be tailored from hard coatings to tribological coatings, with low coefficients of friction and wear. However none of the major industrial coating centers offer this coating in their portfolio, probably because of the lack of the reliable deposition technology. In our research, we employed industrial PVD device of Platit equipped with a central titanium rotating cylindrical cathode. Titanium was sputtered in a mixture of argon and acetylene. When the acetylene supply was gradually increased, deposition process characteristics such as the cathode voltage and the total pressure in the deposition chamber underwent a sudden change. At critical acetylene supply, a sudden drop in the cathode voltage was observed, while before and after the drop, the cathode voltage evolved slowly.

Druh

O - Ostatní výsledky

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů