Understanding of hybrid PVD?PECVD process with the aim of growing hard nc-TiC/a-C:H coatings using industrial devices with a rotating cylindrical magnetron

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F14%3A00074185" target="_blank" >RIV/00216224:14310/14:00074185 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68081723:_____/14:00431189

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2014.02.069" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2014.02.069</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2014.02.069" target="_blank" >10.1016/j.surfcoat.2014.02.069</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Understanding of hybrid PVD?PECVD process with the aim of growing hard nc-TiC/a-C:H coatings using industrial devices with a rotating cylindrical magnetron

Popis výsledku v původním jazyce

Titanium?carbon hard coatings were deposited by sputtering using a rotating cylindrical titanium target in an argon/acetylene gas mixture on cemented tungsten-carbide substrates which were placed on a DC-biasable holder to performa complex rotation around the central rotating cylindrical Ti cathode.While the optimal deposition process parameters to growthe coating of the highest possible hardness and lowfriction coefficientwere sought, the plasma parameters were monitored and correlated with the properties of the deposited coatings. The Ti/Ar line intensity and the cathode voltage exhibited a sudden drop at the conditions forwhich themaximal hardness was reached. EDX analyses also showed a sudden drop in the atomic concentration of titanium and a sudden increase in that of carbon at the same moment.

Název v anglickém jazyce

Understanding of hybrid PVD?PECVD process with the aim of growing hard nc-TiC/a-C:H coatings using industrial devices with a rotating cylindrical magnetron

Popis výsledku anglicky

Titanium?carbon hard coatings were deposited by sputtering using a rotating cylindrical titanium target in an argon/acetylene gas mixture on cemented tungsten-carbide substrates which were placed on a DC-biasable holder to performa complex rotation around the central rotating cylindrical Ti cathode.While the optimal deposition process parameters to growthe coating of the highest possible hardness and lowfriction coefficientwere sought, the plasma parameters were monitored and correlated with the properties of the deposited coatings. The Ti/Ar line intensity and the cathode voltage exhibited a sudden drop at the conditions forwhich themaximal hardness was reached. EDX analyses also showed a sudden drop in the atomic concentration of titanium and a sudden increase in that of carbon at the same moment.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

255

Číslo periodika v rámci svazku

September

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

6

Strana od-do

118-123

Kód UT WoS článku

000343348800019

EID výsledku v databázi Scopus

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