Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F15%3A00081243" target="_blank" >RIV/00216224:14310/15:00081243 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1088/0963-0252/24/6/065022" target="_blank" >http://dx.doi.org/10.1088/0963-0252/24/6/065022</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/0963-0252/24/6/065022" target="_blank" >10.1088/0963-0252/24/6/065022</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

Popis výsledku v původním jazyce

The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered titanium atoms and ions.

Název v anglickém jazyce

Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

Popis výsledku anglicky

The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered titanium atoms and ions.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

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Svazek periodika

24

Číslo periodika v rámci svazku

6

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

13

Strana od-do

"nestránkováno"

Kód UT WoS článku

000368117100027

EID výsledku v databázi Scopus

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