The effect of atmospheric cold plasma cleaning of FTO substrates on the quality of TiO2 electron transport layers for printed carbon-based perovskite solar cells

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F21%3A00119100" target="_blank" >RIV/00216224:14310/21:00119100 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.37904/nanocon.2020.3716" target="_blank" >https://doi.org/10.37904/nanocon.2020.3716</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.37904/nanocon.2020.3716" target="_blank" >10.37904/nanocon.2020.3716</a>

Jazyk výsledku

angličtina

Název v původním jazyce

The effect of atmospheric cold plasma cleaning of FTO substrates on the quality of TiO2 electron transport layers for printed carbon-based perovskite solar cells

Popis výsledku v původním jazyce

In this work, TiO2 electron transport layers (ETL) of printed perovskite solar cells with back carbon electrode (C-PSCs) were prepared on uncleaned, chemically cleaned, and plasma-treated FTO substrates. The effect of cleaning procedure type on the quality of TiO2 ETL has been characterised by XPS and SEM. The C-PSCs with FTO substrates treated by low-temperature atmospheric plasma at ambient air for 10 s reached approximately the same efficiency (4.4%) as with the chemically cleaned FTO (4.5%). From optical microscope and SEM images, it was observed that the plasma cleaned the FTO substrate to some extent, thereby reducing the number of defects and pinholes occurring in the blocking layer. XPS measurements confirmed that chemical and plasma treatment significantly reduced organic species on the FTO surface.

Název v anglickém jazyce

The effect of atmospheric cold plasma cleaning of FTO substrates on the quality of TiO2 electron transport layers for printed carbon-based perovskite solar cells

Popis výsledku anglicky

In this work, TiO2 electron transport layers (ETL) of printed perovskite solar cells with back carbon electrode (C-PSCs) were prepared on uncleaned, chemically cleaned, and plasma-treated FTO substrates. The effect of cleaning procedure type on the quality of TiO2 ETL has been characterised by XPS and SEM. The C-PSCs with FTO substrates treated by low-temperature atmospheric plasma at ambient air for 10 s reached approximately the same efficiency (4.4%) as with the chemically cleaned FTO (4.5%). From optical microscope and SEM images, it was observed that the plasma cleaned the FTO substrate to some extent, thereby reducing the number of defects and pinholes occurring in the blocking layer. XPS measurements confirmed that chemical and plasma treatment significantly reduced organic species on the FTO surface.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GJ19-14770Y" target="_blank" >GJ19-14770Y: Plazmatem produkované nanostrukturované vrstvy pro flexibilní materiály nové generace</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application

ISBN

9788087294987

ISSN

2694-930X

e-ISSN

—

Počet stran výsledku

7

Strana od-do

189-195

Název nakladatele

TANGER Ltd.

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

21. 10. 2020

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000664505500032