Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F22%3A00126228" target="_blank" >RIV/00216224:14310/22:00126228 - isvavai.cz</a>
Výsledek na webu
<a href="https://iopscience.iop.org/article/10.1088/1361-6595/ac7746" target="_blank" >https://iopscience.iop.org/article/10.1088/1361-6595/ac7746</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6595/ac7746" target="_blank" >10.1088/1361-6595/ac7746</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture
Popis výsledku v původním jazyce
Magnetron sputtering in an argon and hydrocarbon gas mixture is a complex deposition process exhibiting features of both physical vapour deposition and plasma enhanced chemical vapour deposition. The hydrocarbon gas decomposes within the plasma and then it is able to form a carbide phase with the target metal atoms or to be deposited as amorphous carbon. In this paper, a simple model for both the direct current (dcMS) and the high power impulse magnetron sputtering (HiPIMS) processes with hydrocarbon gas admixture is presented. The sputtered target racetrack is divided into metallic, compound, and carbon fractions to take into account both the carbide formation and the carbon deposition. To simulate the HiPIMS process, the back-attraction of ionised sputtered metal particles is incorporated into the model. The model is cross-validated with the previously published experiments which were conducted using the same deposition apparatus allowing for the direct comparison of the dcMS and HiPIMS processes. The simulated results correlate with the measured dependencies of the deposition rate, the carbon content in deposited films, and the racetrack fractions on the acetylene supply rate. The presented model is further successfully validated with the evolution of the racetrack composition calculated by SDTrimSP.
Název v anglickém jazyce
Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture
Popis výsledku anglicky
Magnetron sputtering in an argon and hydrocarbon gas mixture is a complex deposition process exhibiting features of both physical vapour deposition and plasma enhanced chemical vapour deposition. The hydrocarbon gas decomposes within the plasma and then it is able to form a carbide phase with the target metal atoms or to be deposited as amorphous carbon. In this paper, a simple model for both the direct current (dcMS) and the high power impulse magnetron sputtering (HiPIMS) processes with hydrocarbon gas admixture is presented. The sputtered target racetrack is divided into metallic, compound, and carbon fractions to take into account both the carbide formation and the carbon deposition. To simulate the HiPIMS process, the back-attraction of ionised sputtered metal particles is incorporated into the model. The model is cross-validated with the previously published experiments which were conducted using the same deposition apparatus allowing for the direct comparison of the dcMS and HiPIMS processes. The simulated results correlate with the measured dependencies of the deposition rate, the carbon content in deposited films, and the racetrack fractions on the acetylene supply rate. The presented model is further successfully validated with the evolution of the racetrack composition calculated by SDTrimSP.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10305 - Fluids and plasma physics (including surface physics)
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2022
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Plasma Sources Science and Technology
ISSN
0963-0252
e-ISSN
1361-6595
Svazek periodika
31
Číslo periodika v rámci svazku
6
Stát vydavatele periodika
GB - Spojené království Velké Británie a Severního Irska
Počet stran výsledku
8
Strana od-do
1-8
Kód UT WoS článku
000818461500001
EID výsledku v databázi Scopus
2-s2.0-85133656194