Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F22%3A00135043" target="_blank" >RIV/00216224:14310/22:00135043 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma

Popis výsledku v původním jazyce

The current-voltage characteristics of capacitively coupled discharges has nonlinear character, which is caused by sheaths and which leads to generation of higher harmonic frequencies of discharge current and voltage. Higher harmonics are strong especially at low pressure. Higher harmonics influence the behaviour of the plasma and, at the same time, they sensitively react on number of discharge parameters, which enables to use them for monitoring of various deposition and etching processes. The presentation summarizes several topics related to higher harmonic frequencies, namely the problematics of probe measurement of the high-frequency components of plasma potential, modeling of generation of higher harmonics and analysis why higher harmonics react so sensitively on the presence of a thin film during deposition/etching processes.

Název v anglickém jazyce

Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma

Popis výsledku anglicky

The current-voltage characteristics of capacitively coupled discharges has nonlinear character, which is caused by sheaths and which leads to generation of higher harmonic frequencies of discharge current and voltage. Higher harmonics are strong especially at low pressure. Higher harmonics influence the behaviour of the plasma and, at the same time, they sensitively react on number of discharge parameters, which enables to use them for monitoring of various deposition and etching processes. The presentation summarizes several topics related to higher harmonic frequencies, namely the problematics of probe measurement of the high-frequency components of plasma potential, modeling of generation of higher harmonics and analysis why higher harmonics react so sensitively on the presence of a thin film during deposition/etching processes.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/GA19-15240S" target="_blank" >GA19-15240S: Multifunkční nanokompozitní polymerní tenké vrstvy s řízenými povrchovými a mechanickými vlastnostmi připravené v RF prachovém plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů