Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14740%2F14%3A00073337" target="_blank" >RIV/00216224:14740/14:00073337 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/60162694:G43__/14:00522240 RIV/00216305:26210/14:PU110147

Výsledek na webu

<a href="http://ac.els-cdn.com/S0040609013021007/1-s2.0-S0040609013021007-main.pdf?_tid=83eecb72-d868-11e4-9e7b-00000aab0f6c&acdnat=1427890593_5f13d02ce4a284783378d30a332962c6" target="_blank" >http://ac.els-cdn.com/S0040609013021007/1-s2.0-S0040609013021007-main.pdf?_tid=83eecb72-d868-11e4-9e7b-00000aab0f6c&acdnat=1427890593_5f13d02ce4a284783378d30a332962c6</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2013.12.036" target="_blank" >10.1016/j.tsf.2013.12.036</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry

Popis výsledku v původním jazyce

Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and whichis also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that thenon-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed. (C) 2013 Elsevier B.V.

Název v anglickém jazyce

Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry

Popis výsledku anglicky

Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and whichis also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that thenon-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed. (C) 2013 Elsevier B.V.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

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Svazek periodika

571

Číslo periodika v rámci svazku

november

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

6

Strana od-do

573-578

Kód UT WoS článku

000346055200044

EID výsledku v databázi Scopus

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