Hloubkové profilování velmi tenkých vrstev a multivrstev

Kód výsledku v IS VaVaI

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RIV/00216305:26210/05:PU54251

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Depth Profiling of Ultrathin Films and Their Multilayers by DSIMS

Popis výsledku v původním jazyce

Dynamic secondary ion mass spectroscopy (DSIMS) is a technique frequently used for depth profiling of elemental composition of thin films. It is generally accepted that due to atom mixing by primary ions of typical energies (100 keV), only the depth profiles of thin films thicker than 10 nm can be investigated. However, quite recently, DSIMS has been used for profiling ultrathin films of thicknesses below this value. In this applications the energy of the primary ion beam is limited to a few hundreds off eV only and thus the mixing of atoms reduced. In the contribution the ability of DSIMS to reveal depth profiles of ultrathin films (< 5 nm) and their multilayers will be demonstrated. As an example, the results on depth profiling the structures as Ni/Cor Mo/Si multilayers prepared by magnetron sputtering and used for x-ray mirrors will be given. Additionally, the depth profiles of ultrathin films of Co and Al2O3 and of their magnetic multilayers will be demonstrated as well. All these

Název v anglickém jazyce

Depth Profiling of Ultrathin Films and Their Multilayers by DSIMS

Popis výsledku anglicky

Dynamic secondary ion mass spectroscopy (DSIMS) is a technique frequently used for depth profiling of elemental composition of thin films. It is generally accepted that due to atom mixing by primary ions of typical energies (100 keV), only the depth profiles of thin films thicker than 10 nm can be investigated. However, quite recently, DSIMS has been used for profiling ultrathin films of thicknesses below this value. In this applications the energy of the primary ion beam is limited to a few hundreds off eV only and thus the mixing of atoms reduced. In the contribution the ability of DSIMS to reveal depth profiles of ultrathin films (< 5 nm) and their multilayers will be demonstrated. As an example, the results on depth profiling the structures as Ni/Cor Mo/Si multilayers prepared by magnetron sputtering and used for x-ray mirrors will be given. Additionally, the depth profiles of ultrathin films of Co and Al2O3 and of their magnetic multilayers will be demonstrated as well. All these

Druh

A - Audiovizuální tvorba

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2005

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

ISBN

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Místo vydání

Seville

Název nakladatele resp. objednatele

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Verze

1

Identifikační číslo nosiče

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