PRACTICALLY USABLE QUINHYDRONE CHEMICAL PASSIVATION OF A SILICON SURFACE FOR SOLAR CELLS

Kód výsledku v IS VaVaI

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Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

PRACTICALLY USABLE QUINHYDRONE CHEMICAL PASSIVATION OF A SILICON SURFACE FOR SOLAR CELLS

Popis výsledku v původním jazyce

This work deals with an examination of a different solution types for the chemical passivation of a silicon surface. Various solutions are tested on silicon wafers for their consequent comparison. The main purpose of this work is to find optimal solutionfor practical usage, which suits the requirements of a time stability and start-up velocity of passivation, reproducibility of the measurements and a possibility of a perfect cleaning of a passivating solution remains from a silicon surface, so that theparameters of a measured silicon wafer will not worsen and there will not be any contamination of the other wafers series in the production after a repetitive return of the measured wafer into the production process. This work confirms the drawbacks ofcommonly used iodine passivation and a method of an effective chemical passivation with a quinhydrone in methanol solution was suggested. The solution with a concentration of 0.07 mol /dm3 fulfils all required criteria. The work also conf

Název v anglickém jazyce

PRACTICALLY USABLE QUINHYDRONE CHEMICAL PASSIVATION OF A SILICON SURFACE FOR SOLAR CELLS

Popis výsledku anglicky

This work deals with an examination of a different solution types for the chemical passivation of a silicon surface. Various solutions are tested on silicon wafers for their consequent comparison. The main purpose of this work is to find optimal solutionfor practical usage, which suits the requirements of a time stability and start-up velocity of passivation, reproducibility of the measurements and a possibility of a perfect cleaning of a passivating solution remains from a silicon surface, so that theparameters of a measured silicon wafer will not worsen and there will not be any contamination of the other wafers series in the production after a repetitive return of the measured wafer into the production process. This work confirms the drawbacks ofcommonly used iodine passivation and a method of an effective chemical passivation with a quinhydrone in methanol solution was suggested. The solution with a concentration of 0.07 mol /dm3 fulfils all required criteria. The work also conf

Druh

D - Stať ve sborníku

CEP obor

JA - Elektronika a optoelektronika, elektrotechnika

OECD FORD obor

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Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2010

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Student EEICT 2010

ISBN

978-80-214-4079-1

ISSN

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e-ISSN

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Počet stran výsledku

4

Strana od-do

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Název nakladatele

Neuveden

Místo vydání

Brno

Místo konání akce

FEKT VUT v Brně

Datum konání akce

29. 4. 2010

Typ akce podle státní příslušnosti

CST - Celostátní akce

Kód UT WoS článku

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