Optical properties of a-SiC:H films deposited by continuous wave and pulsed plasmas

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F16%3APU122520" target="_blank" >RIV/00216305:26310/16:PU122520 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Optical properties of a-SiC:H films deposited by continuous wave and pulsed plasmas

Popis výsledku v původním jazyce

Thin films in a form of hydrogenated amorphous carbon-silicon alloys (a-SiC:H) can be prepared from organosilicon monomers using plasma-enhanced chemical vapor deposition (PECVD). The a-SiC:H films may have various optical properties with application potential. Optical films of controllable properties are essential for optical and optoelectronic devices as barrier, anti-scratch, biocompatible, transparent, antireflective, or dielectric coatings, and optical filters. We deposited a-SiC:H films from tetravinylsilane monomer at different powers using continuous wave (10-70 W) and pulsed (2-150 W) plasmas (PECVD). In situ phase-modulated spectroscopic ellipsometer (UVISEL, Jobin-Yvon) was used to determine the film thickness and optical properties (refractive index, extinction coefficient) ranging 250-830 nm. The deposition rate for a-SiC:H films varied from 82 to 262 nm/min as a function of power and was compared for continuous wave and pulsed plasmas. The dispersion curves for refractive index and extin

Název v anglickém jazyce

Optical properties of a-SiC:H films deposited by continuous wave and pulsed plasmas

Popis výsledku anglicky

Thin films in a form of hydrogenated amorphous carbon-silicon alloys (a-SiC:H) can be prepared from organosilicon monomers using plasma-enhanced chemical vapor deposition (PECVD). The a-SiC:H films may have various optical properties with application potential. Optical films of controllable properties are essential for optical and optoelectronic devices as barrier, anti-scratch, biocompatible, transparent, antireflective, or dielectric coatings, and optical filters. We deposited a-SiC:H films from tetravinylsilane monomer at different powers using continuous wave (10-70 W) and pulsed (2-150 W) plasmas (PECVD). In situ phase-modulated spectroscopic ellipsometer (UVISEL, Jobin-Yvon) was used to determine the film thickness and optical properties (refractive index, extinction coefficient) ranging 250-830 nm. The deposition rate for a-SiC:H films varied from 82 to 262 nm/min as a function of power and was compared for continuous wave and pulsed plasmas. The dispersion curves for refractive index and extin

Druh

O - Ostatní výsledky

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

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Projekt

<a href="/cs/project/GA16-09161S" target="_blank" >GA16-09161S: Syntéza multifunkčních plazmových polymerů pro polymerní kompozity bez rozhraní</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů