Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F19%3APU133416" target="_blank" >RIV/00216305:26620/19:PU133416 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0042207X18324588?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0042207X18324588?via%3Dihub</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2019.108954" target="_blank" >10.1016/j.vacuum.2019.108954</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching

Popis výsledku v původním jazyce

The surface nanostructuring of boron doped diamond (BDD) can further enhance its unique properties e.g. in electrochemical sensing, photoelectrochemical cells, field emission devices and various kinds of sensors. Here we present an investigation of plasmatic nanostructuring of BDD films without use of a time-consuming masking process. RF plasma technique was used to etch surface nanostructures with dimensions ranging from tenths to hundreds of nm in width and height. The size and shape of achieved diamond nanostructures were influenced only by applied etching parameters. We found that the etched carbon is re-deposited in an amorphous form creating a mask and this self-masking process is responsible for the final shape of obtained structures. Therefore, this technique is effectively controllable by changing plasma power, gas type and re-deposition of masking material. Utilization of various gas types, pressures and RF powers revealed the physical type of etching to be dominant over the chemical at both high and low energy ions. The nanostructured surfaces were then observed and characterized by SEM and Raman Spectroscopy to investigate the nanostructures dimensions and to confirm the remaining diamond quality.

Název v anglickém jazyce

Study of self-masking nanostructuring of boron doped diamond films by RF plasma etching

Popis výsledku anglicky

The surface nanostructuring of boron doped diamond (BDD) can further enhance its unique properties e.g. in electrochemical sensing, photoelectrochemical cells, field emission devices and various kinds of sensors. Here we present an investigation of plasmatic nanostructuring of BDD films without use of a time-consuming masking process. RF plasma technique was used to etch surface nanostructures with dimensions ranging from tenths to hundreds of nm in width and height. The size and shape of achieved diamond nanostructures were influenced only by applied etching parameters. We found that the etched carbon is re-deposited in an amorphous form creating a mask and this self-masking process is responsible for the final shape of obtained structures. Therefore, this technique is effectively controllable by changing plasma power, gas type and re-deposition of masking material. Utilization of various gas types, pressures and RF powers revealed the physical type of etching to be dominant over the chemical at both high and low energy ions. The nanostructured surfaces were then observed and characterized by SEM and Raman Spectroscopy to investigate the nanostructures dimensions and to confirm the remaining diamond quality.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

21001 - Nano-materials (production and properties)

Projekt

<a href="/cs/project/FV10477" target="_blank" >FV10477: Technologie kombinovaného zdroje plasmatu pro vznik pokročilých povrchových úprav</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

—

Svazek periodika

170

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

22

Strana od-do

1-22

Kód UT WoS článku

000498325300002

EID výsledku v databázi Scopus

2-s2.0-85072529136