Optical and fractal properties of sputter deposited TiO2 films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F23%3APU148506" target="_blank" >RIV/00216305:26620/23:PU148506 - isvavai.cz</a>

Výsledek na webu

<a href="https://link.springer.com/article/10.1007/s11082-022-04295-2" target="_blank" >https://link.springer.com/article/10.1007/s11082-022-04295-2</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/s11082-022-04295-2" target="_blank" >10.1007/s11082-022-04295-2</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Optical and fractal properties of sputter deposited TiO2 films

Popis výsledku v původním jazyce

In this study, TiO2 films were deposited on the glass substrates at different pressures using a DC magnetron sputtering system. The surface topography, fractality, particle size, transparency spectra, and roughness of the deposited films were analyzed through atomic force microscopy in non-contact mode and spectrophotometer (UV-visible) analysis. The Gwyddion open source software was used to analyze the AFM results. The surface morphology, absorption spectra, transparency, and energy band gap of the films were studied through analytical and mathematical relations, including fractal and multifractal dimensions of the films. The pressure influenced the particle size leading to the changes in the surface roughness and fractality of the films. When the working pressure increased above 8 x 10(-3) Torr, the nonuniformity in the distribution of surface properties and multifractality increased. Additionally, using optical data and the Tauc's method, their energy gap was calculated. It was revealed that the TiO2 coatings have a relatively large energy gap of similar to 4 eV, probably due to their small grain size.

Název v anglickém jazyce

Optical and fractal properties of sputter deposited TiO2 films

Popis výsledku anglicky

In this study, TiO2 films were deposited on the glass substrates at different pressures using a DC magnetron sputtering system. The surface topography, fractality, particle size, transparency spectra, and roughness of the deposited films were analyzed through atomic force microscopy in non-contact mode and spectrophotometer (UV-visible) analysis. The Gwyddion open source software was used to analyze the AFM results. The surface morphology, absorption spectra, transparency, and energy band gap of the films were studied through analytical and mathematical relations, including fractal and multifractal dimensions of the films. The pressure influenced the particle size leading to the changes in the surface roughness and fractality of the films. When the working pressure increased above 8 x 10(-3) Torr, the nonuniformity in the distribution of surface properties and multifractality increased. Additionally, using optical data and the Tauc's method, their energy gap was calculated. It was revealed that the TiO2 coatings have a relatively large energy gap of similar to 4 eV, probably due to their small grain size.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20200 - Electrical engineering, Electronic engineering, Information engineering

Projekt

<a href="/cs/project/FV40238" target="_blank" >FV40238: Pokročilé mikroskopické techniky</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Optical and Quantum Electronics

ISSN

0306-8919

e-ISSN

1572-817X

Svazek periodika

55

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

15

Strana od-do

„“-„“

Kód UT WoS článku

000900117000030

EID výsledku v databázi Scopus

2-s2.0-85144171375